Contamination experiments for Mo/Si multilayer mirrors with the use of single-bunch synchrotron radiation

被引：1
作者：
Niibe, Masahito [1 ]
Koida, Keigo [1 ]
Kakutani, Yukinobu [1 ]
机构：
[1] Univ Hyogo, Lab Adv Sci & Technol Ind, Kamigori, Hyogo 6781205, Japan
来源：
11TH INTERNATIONAL CONFERENCE ON SYNCHROTRON RADIATION INSTRUMENTATION (SRI 2012) | 2013年 / 425卷
关键词：
LITHOGRAPHY PROJECTION OPTICS; SURFACE OXIDATION; EXTREME; PERFORMANCE;
D O I：
10.1088/1742-6596/425/13/132021
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
An extreme ultraviolet (EUV) irradiation experiment with the use of single-bunch synchrotron radiation (SR) was carried out to evaluate the optics lifetime for EUV lithography due to contaminations. The sequential change in the reflectivity of Ru-capped Mo/Si multilayer mirrors was measured during EUV irradiation in the presence of hydrocarbon gas or water vapor vacuum environment. The EUV dose dependence of decreases in reflectivity for single-bunch SR was almost the same as that for light-attenuated multibunch SR. From the results, there was no marked difference in the dependence of decrease in reflectivity on pulse structure in the frequency range of 2.5 to 500 MHz.
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页数：4
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共 12 条
  • [1] Ando A, 2004, AIP CONF PROC, V705, P13, DOI 10.1063/1.1757722
  • [2] Design and performance of capping layers for extreme-ultraviolet multilayer mirrors
    Bajt, SA
    Chapman, HN
    Nguyen, N
    Alameda, J
    Robinson, JC
    Malinowski, M
    Gullikson, E
    Aquila, A
    Tarrio, C
    Grantham, S
    [J]. APPLIED OPTICS, 2003, 42 (28) : 5750 - 5758
  • [3] Modeling radiation-induced carbon contamination of extreme ultraviolet optics
    Hollenshead, J
    Klebanoff, L
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (01): : 64 - 82
  • [4] Use of gas-phase ethanol to mitigate extreme UV/water oxidation of extreme UV optics
    Klebanoff, LE
    Malinowski, ME
    Clift, WM
    Steinhaus, C
    Grunow, P
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (02): : 425 - 432
  • [5] Prevention of MoSi multilayer reflection loss in EUVL tools
    Meiling, H
    Mertens, B
    Stietz, F
    Wedowski, M
    Klein, R
    Kurt, R
    Louis, E
    Yakshin, A
    [J]. SOFT X-RAY AND EUV IMAGING SYSTEMS II, 2001, 4506 : 93 - 104
  • [6] Meiling H, 2006, PROC SPIE, V6154, pXLV, DOI 10.1117/12.657348
  • [7] In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination
    Niibe, Masahito
    Kakutani, Yukinobu
    Koida, Keigo
    Matsunari, Shuichi
    Aoki, Takashi
    Terashima, Shigeru
    Takase, Hiromitsu
    Murakami, Katsuhiko
    Fukuda, Yasuaki
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06): : 2118 - 2122
  • [8] New extreme ultraviolet irradiation and multilayer evaluation system for extreme ultraviolet lithography mirror contamination in the NewSUBARU
    Niibe, Masahito
    Kakutani, Yukinobu
    Terashima, Shigeru
    Takase, Hiromitu
    Gomei, Yoshio
    Matsunari, Shuichi
    Aoki, Takashi
    Murakami, Katsuhiko
    Fukuda, Yasuaki
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (6B): : 5373 - 5377
  • [9] Nonlinear Behavior of Decrease in Reflectivity of Multilayer Mirrors for Extreme Ultraviolet Lithography Optics by High-Flux Extreme Ultraviolet Irradiation in Various Vacuum Environments
    Niibe, Masahito
    Koida, Keigo
    Kakutani, Yukinobu
    Nakayama, Takahiro
    Terashima, Shigeru
    Miyake, Akira
    Kubo, Hiroyoshi
    Matsunari, Shuichi
    Aoki, Takashi
    Kawata, Shintaro
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (06)
  • [10] Protection and reduction of surface oxidation of Mo/Si multilayers for extreme ultraviolet lithography projection optics by control of hydrocarbon gas atmosphere
    Niibe, Masahito
    Koida, Keigo
    Kakutani, Yukinobu
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26 (06): : 2230 - 2235
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