Surface reduction of ruthenium compounds with long exposure to an X-ray beam in photoelectron spectroscopy

被引:32
|
作者
Froment, P
Genet, MJ
Devillers, M
机构
[1] Univ Catholique Louvain, Unite Chim Inorgan Analyt & Nucl, B-1348 Louvain, Belgium
[2] Univ Catholique Louvain, Unite Chim Interfaces, B-1348 Louvain, Belgium
关键词
carbon; reduction; RuO3; ruthenium; XPS;
D O I
10.1016/S0368-2048(98)00462-9
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
The reduction of Ru at the surface of commercial RuCl3 and RuO2 has been observed during XPS analysis. The experiments have been performed with either a non-monochromatized (Mg K-alpha) or a monochromatized (Al K-alpha) X-ray beam. Ruthenium reduction is enhanced by increasing the X-ray dose, but the residual pressure exerts only a weak influence. The initial composition of commercial ruthenium (III) chloride hydrate is a complex mixture of chloro or chlorohydroxo species rather than pure RuCl3. nH(2)O. RuCl3 is not suitable as a reference compound for ruthenium chloride compounds in XPS analysis, because it contains mainly Ru(IV) which is reduced under X-ray. A similar reduction occurs at the surface of RuO2 samples (by reduction of RuO3 layers), and on the adventitious carbon. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:119 / 126
页数:8
相关论文
共 50 条
  • [41] Quantitative surface analysis by Auger and x-ray photoelectron spectroscopy
    Tilinin, IS
    Jablonski, A
    Werner, WSM
    PROGRESS IN SURFACE SCIENCE, 1996, 52 (04) : 193 - 335
  • [42] Surface charging of insulating samples in X-ray photoelectron spectroscopy
    Vereecke, G
    Rouxhet, PG
    SURFACE AND INTERFACE ANALYSIS, 1998, 26 (07) : 490 - 497
  • [43] Surface chemistry studied by in situ X-ray photoelectron spectroscopy
    Denecke, R
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2005, 80 (05): : 977 - 986
  • [44] Surface chemistry studied by in situ X-ray photoelectron spectroscopy
    R. Denecke
    Applied Physics A, 2005, 80 : 977 - 986
  • [45] Quantitative surface chemical microscopy by X-ray photoelectron spectroscopy
    Walton, John
    2007, John Wiley and Sons Ltd (19):
  • [46] Surface Analysis of Nanocomplexes by X-ray Photoelectron Spectroscopy (XPS)
    Korin, Efrat
    Froumin, Natalya
    Cohen, Smadar
    ACS BIOMATERIALS SCIENCE & ENGINEERING, 2017, 3 (06): : 882 - 889
  • [47] Improvements in the reliability of X-ray photoelectron spectroscopy for surface analysis
    Powell, CJ
    JOURNAL OF CHEMICAL EDUCATION, 2004, 81 (12) : 1734 - 1750
  • [48] X-RAY PHOTOELECTRON SPECTROSCOPY OF A DOPED SILICON SURFACE.
    Buzaneva, E.V.
    Kostikov, Yu.P.
    Strikha, V.I.
    Strykanov, V.S.
    Shustrov, B.A.
    Soviet physics. Semiconductors, 1981, 15 (02): : 155 - 158
  • [49] QUANTITATIVE SURFACE ANALYSIS BY X-RAY PHOTOELECTRON-SPECTROSCOPY
    POWELL, CJ
    LARSON, PE
    APPLIED SURFACE SCIENCE, 1978, 1 (02) : 186 - 201
  • [50] Quantitative surface characterization using X-ray photoelectron spectroscopy
    Hercules, DM
    FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1996, 355 (3-4): : 209 - 215