Control of radial density profile of nano-particles produced in reactive plasma by amplitude modulation of radio frequency discharge voltage

被引：9

作者：

Kamataki, Kunihiro ^{[1
]}

Koga, Kazunori ^{[2
]}

Uchida, Giichiro ^{[2
]}

Itagaki, Naho ^{[2
]}

Yamashita, Daisuke ^{[2
]}

Matsuzaki, Hidefumi ^{[2
]}

Shiratani, Masaharu ^{[2
]}

机构：

[1] Kyushu Univ, Fac Arts & Sci, Nishi Ku, Fukuoka 812, Japan

[2] Kyushu Univ, Dept Elect, Fac Informat Sci & Elect Engn, Nishi Ku, Fukuoka 812, Japan

来源：

THIN SOLID FILMS | 2012年 / 523卷

关键词：

Plasma processing; Deposition; Amplitude modulation; rf discharge; COUPLED RF DISCHARGES; TRANSPORT; FILMS;

D O I：

10.1016/j.tsf.2012.07.059

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We investigate uniformity of radial density profile of nano-particles in capacitively-coupled radio frequency discharge with an amplitude modulation (AM) of rf discharge voltage, by a two-dimensional laser light scattering method. Their densities at the center and that at the edge of the electrode increase by 3 and 24 times when the amplitude modulation level increases from 0 (without AM) to 30%. The uniformity of radial density profile of nano-particles is significantly improved by using the AM method. (C) 2012 Elsevier B. V. All rights reserved.

引用

页码：76 / 79

页数：4

共 16 条

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