Control of radial density profile of nano-particles produced in reactive plasma by amplitude modulation of radio frequency discharge voltage

被引：9
作者：
Kamataki, Kunihiro [1 ]
Koga, Kazunori [2 ]
Uchida, Giichiro [2 ]
Itagaki, Naho [2 ]
Yamashita, Daisuke [2 ]
Matsuzaki, Hidefumi [2 ]
Shiratani, Masaharu [2 ]
机构：
[1] Kyushu Univ, Fac Arts & Sci, Nishi Ku, Fukuoka 812, Japan
[2] Kyushu Univ, Dept Elect, Fac Informat Sci & Elect Engn, Nishi Ku, Fukuoka 812, Japan
来源：
THIN SOLID FILMS | 2012年 / 523卷
关键词：
Plasma processing; Deposition; Amplitude modulation; rf discharge; COUPLED RF DISCHARGES; TRANSPORT; FILMS;
D O I：
10.1016/j.tsf.2012.07.059
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We investigate uniformity of radial density profile of nano-particles in capacitively-coupled radio frequency discharge with an amplitude modulation (AM) of rf discharge voltage, by a two-dimensional laser light scattering method. Their densities at the center and that at the edge of the electrode increase by 3 and 24 times when the amplitude modulation level increases from 0 (without AM) to 30%. The uniformity of radial density profile of nano-particles is significantly improved by using the AM method. (C) 2012 Elsevier B. V. All rights reserved.
引用
收藏
页码：76 / 79
页数：4
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