A study of near-infrared nanosecond laser ablation of silicon carbide

被引:57
|
作者
Doan Hong Duc [1 ]
Naoki, Iwatani [1 ]
Kazuyoshi, Fushinobu [1 ]
机构
[1] Tokyo Inst Technol, Meguro Ku, Tokyo 1528550, Japan
关键词
Laser ablation; Silicon carbide; Ablation threshold; Free carrier absorption; HOLES; FILM; 4H;
D O I
10.1016/j.ijheatmasstransfer.2013.06.050
中图分类号
O414.1 [热力学];
学科分类号
摘要
This work presents a fundamental study about ablation threshold, absorption coefficient and absorption mechanism of silicon carbide (SiC) in the laser drilling process. Experimental study has been performed on single infrared (1064 nm) ns pulse laser ablation of SiC at various fluence values. Hole diameters were measured to predict the absorption threshold. Based on the ablation threshold, an average absorption coefficient of SiC at infrared wavelength during the laser ablation process is calculated. The result is discussed based on absorption coefficient dependence on doping concentration and temperature in semiconductor. A preliminary model is proposed that accounts for the heat conduction and surface evaporation to predict the cross-sectional shape of drilling hole. Analytical modeling results are in good agreement with observed features produced from the laser. The paper will conclude with suggestions for further research and potential applications for the work. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码:713 / 718
页数:6
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