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Highly Spin-Polarized Tunneling in Epitaxial Magnetic Tunnel Junctions with a Co2MnSi Electrode and a MgO Barrier with Improved Interfacial Structural Properties
被引:10
|作者:
Liu, Hong-xi
[1
]
Honda, Yusuke
[1
]
Matsuda, Ken-ichi
[1
]
Arita, Masashi
[1
]
Uemura, Tetsuya
[1
]
Yamamoto, Masafumi
[1
]
机构:
[1] Hokkaido Univ, Div Elect Informat, Grad Sch Informat Sci & Technol, Sapporo, Hokkaido 0600814, Japan
关键词:
HEUSLER ALLOY;
ROOM-TEMPERATURE;
THIN-FILM;
MAGNETORESISTANCE;
SPINTRONICS;
FABRICATION;
COBALT;
D O I:
10.1143/JJAP.51.093004
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Fully epitaxial magnetic tunnel junctions (MTJs) with a Heusler alloy Co2MnSi electrode and a MgO barrier were prepared on MgO-buffered MgO(001) substrates with various layer structures to elucidate the contribution of coherent tunneling to the spin-dependent tunneling characteristics of these MTJs, which potentially feature both the half-metallicity of Co2MnSi and coherent tunneling. MTJs consisting of (from the lower side) Co50Fe50 (CoFe)/MgO/Co2MnSi or CoFe-buffered Co2MnSi/MgO/CoFe showed almost identical, high tunnel magnetoresistance (TMR) ratios of 335% at 290 K (1049% at 4.2 K) and 340% at 290K (879% at 4.2 K), respectively. In contrast, MTJs consisting of MgO-buffered Co2MnSi/MgO/CoFe showed a lower TMR ratio of 173% at 290 K (448% at 4.2 K). The higher TMR ratios obtained for CoFe/MgO/Co2MnSi MTJs and CoFe-buffered Co2MnSi/MgO/CoFe MTJs can be ascribed to the enhanced contribution of coherent tunneling that originated from decreased misfit dislocation densities at the lower and upper interfaces with a MgO barrier. (C) 2012 The Japan Society of Applied Physics
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页数:9
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