Highly Efficient Surface Relief Formation via Photoembossing of a Supramolecular Polymer

被引：18

作者：

Hermans, Ko ^{[1
,2
]}

Tomatsu, Itsuro ^{[1
,2
]}

Matecki, Michael ^{[1
,2
]}

Sijbesma, Rint P. ^{[1
,2
]}

Bastiaansen, Cees W. M. ^{[1
,2
]}

Broer, Dirk J. ^{[3
]}

机构：

[1] Eindhoven Univ Technol, Fac Chem & Chem Engn, NL-5600 AX Eindhoven, Netherlands

[2] Dutch Polymer Inst, NL-5600 AX Eindhoven, Netherlands

[3] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands

来源：

MACROMOLECULAR CHEMISTRY AND PHYSICS | 2008年 / 209卷 / 20期

关键词：

micro-structure; self-organization; supramolecular structures; thin films;

D O I：

10.1002/macp.200800355

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

A new highly efficient photopolymer based on a supramolecular polymer was developed for creating surface relief structures in polymer thin films via a reaction/diffusion mechanism known as photoembossing. The effect of the photoinitiator content, the exposure dose, and developing temperature were investigated and the optimal settings were determined by differential scanning calorimetry (DSC) and confocal microscopy. It was found that a surface relief structure of 2.1 mu m could be obtained in a 3 mu m thin film, which is more than 2.5 times higher than can be achieved in the conventional polymer/monomer based photopolymer systems.

引用

页码：2094 / 2099

页数：6

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