Plasma diagnostics in pulsed laser deposition of GaLaS chalcogenides

被引：18

作者：

Pompilian, O. G. ^{[1
]}

Gurlui, S. ^{[2
]}

Nemec, P. ^{[3
]}

Nazabal, V. ^{[4
]}

Ziskind, M. ^{[1
]}

Focsa, C. ^{[1
]}

机构：

[1] Univ Lille 1, UMR 8523, Lab Phys Lasers Atomes & Mol, F-59655 Villeneuve Dascq, France

[2] Alexandru Ioan Cuza Univ, Dept Phys, Iasi 700506, Romania

[3] Univ Pardubice, Fac Chem Technol, Pardubice 53210, Czech Republic

[4] Univ Rennes 1, Lab Verres & Ceram, F-35042 Rennes, France

来源：

APPLIED SURFACE SCIENCE | 2013年 / 278卷

关键词：

Pulsed laser deposition; Plasma dynamics; Optical emission spectroscopy; Chalcogenides; ABLATION; GLASSES; DESORPTION;

D O I：

10.1016/j.apsusc.2012.11.069

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The aim of this work is to characterize the ejection plume obtained by laser ablation of GaLaS (GLS) samples in order to better understand the ablation phenomena for optimizing the pulsed laser deposition of chalcogenide thin films. The dynamics of the plasma between target and substrate was investigated through time-and space-resolved optical emission spectroscopy. High-resolution optical spectra have been recorded in the UV-VIS range using a 500-mm focal length monochromator and a fast gate ICCD camera. From the space-time evolution of the optical signals, the velocities of various species (including neutrals and ions) have been derived. Using the relative intensity method, the space-and time-evolution of the excitation temperature and electronic density have been determined. A complex behavior of the laser ablation plasma has been revealed. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：352 / 356

页数：5

共 50 条

[21] Numerical simulation of laser induced plasma during pulsed laser deposition
Zhang, ZY
Han, ZX
Dulikravich, GS
JOURNAL OF APPLIED PHYSICS, 2001, 90 (12) : 5889 - 5897
[22] Plasma parameters in pulsed laser-plasma deposition of thin films
Bremen Inst of Applied Beam, Technology, Bremen, Germany
Appl Surf Sci, (122-125):
[23] Results of modeling laser-induced plasma in pulsed laser deposition
Granse, G
Vollmar, S
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1996, 24 (01) : 47 - 48
[24] Plasma parameters in pulsed laser-plasma deposition of thin films
Metev, S
Ozegowski, M
Sepold, G
Burmester, S
APPLIED SURFACE SCIENCE, 1996, 96-8 : 122 - 125
[25] DEVELOPMENT OF A HIGH-INTENSITY PULSED SUBMILLIMETER LASER FOR PLASMA DIAGNOSTICS
EVANS, DE
SHARP, LE
PEEBLES, WA
TAYLOR, G
OPTICS COMMUNICATIONS, 1976, 18 (01) : 9 - 10
[26] PULSED-ULTRAVIOLET LASER RAMAN DIAGNOSTICS OF PLASMA PROCESSING DISCHARGES
HARGIS, PJ
GREENBERG, KE
APPLIED PHYSICS LETTERS, 1988, 53 (19) : 1809 - 1811
[27] Laser diagnostics of the plasma in the S-300 pulsed power generator
Kalinin, YG
Korel'skii, AV
Kravchenko, EV
Kubes, P
Shashkov, AY
XV International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers Pt 1 and 2, 2005, 5777 : 808 - 811
[28] Synthesis of nanosize powders by pulsed laser ablation and related plasma diagnostics
Yatsui, K
Jiang, W
Nishiura, K
Yukawa, T
Grigoriu, C
Chis, I
Marcu, A
Miu, D
FIFTH CONFERENCE ON OPTICS (ROMOPTO '97), PTS 1 AND 2, 1998, 3405 : 153 - 161
[29] Insight into the plasma oxidation process during pulsed laser deposition
Irimiciuc, Stefan A.
Chertopalov, Sergii
Bulir, Jiri
Vondracek, Martin
Fekete, Ladislav
Jiricek, Petr
Novotny, Michal
Craciun, Valentin
Lancok, Jan
PLASMA PROCESSES AND POLYMERS, 2022, 19 (02)
[30] Reactive pulsed laser deposition assisted by RF discharge plasma
Basillais, A
Mathias, J
Boulmer-Leborgne, C
Perrière, J
HIGH-POWER LASER ABLATION III, 2000, 4065 : 242 - 248

← 1 2 3 4 5 →