Deep-Ultraviolet Light-Emitting Diodes Fabricated on AlN Substrates Prepared by Hydride Vapor Phase Epitaxy

被引:113
作者
Kinoshita, Toru [1 ,2 ]
Hironaka, Keiichiro [1 ]
Obata, Toshiyuki [1 ]
Nagashima, Toru [1 ,3 ]
Dalmau, Rafael [4 ]
Schlesser, Raoul [4 ]
Moody, Baxter [4 ]
Xie, Jinqiao [4 ]
Inoue, Shin-ichiro [2 ,5 ]
Kumagai, Yoshinao [3 ]
Koukitu, Akinori [3 ]
Sitar, Zlatko [4 ,6 ]
机构
[1] Tokuyama Corp, Tsukuba Res Labs, Tsukuba, Ibaraki 3004247, Japan
[2] Kobe Univ, Dept Mech Engn, Kobe, Hyogo 6578501, Japan
[3] Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
[4] HexaTech Inc, Morrisville, NC 27560 USA
[5] Natl Inst Informat & Commun Technol, Adv ICT Res Inst, Kobe, Hyogo 6512492, Japan
[6] N Carolina State Univ, Dept Mat Sci & Engn, Raleigh, NC 27695 USA
基金
日本学术振兴会;
关键词
GROWTH; CRYSTALS;
D O I
10.1143/APEX.5.122101
中图分类号
O59 [应用物理学];
学科分类号
摘要
AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) were fabricated on AlN substrates. The AlN substrates were prepared by growing thick hydride vapor phase epitaxy (HVPE)-AlN layers on bulk AlN substrates prepared by physical vapor transport (PVT). After growing an LED structure, the PVT-AlN substrates were removed by mechanical polishing. This process allowed the fabrication of DUV-LEDs on HVPE-AlN substrates with high crystalline quality and DUV optical transparency. The DUV-LEDs exhibited a single emission peaking at 268nm through the HVPE-AlN substrates. The output power as high as 28mW was obtained at an injection current of 250 mA. (C) 2012 The Japan Society of Applied Physics
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页数:3
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