Fabrication of anti-reflective microstructures on chalcogenide crystals by femtosecond laser ablation

被引：23

作者：

Bushunov, Andrey A. ^{[1
]}

Tarabrin, Mikhail K. ^{[1
,2
]}

Lazarev, Vladimir A. ^{[1
]}

Karasik, Valeriy E. ^{[1
]}

Korostelin, Yurii, V ^{[2
]}

Frolov, Mikhail P. ^{[2
]}

Skasyrsky, Yan K. ^{[2
]}

Kozlovsky, Vladimir, I ^{[2
,3
]}

机构：

[1] Bauman Mosrow State Thchn Univ, Moscow 105005, Russia

[2] Russian Acad Sci, PN Lebedev Phys Inst, Moscow 119991, Russia

[3] Natl Res Nucl Univ MEPhI, Moscow 115409, Russia

来源：

OPTICAL MATERIALS EXPRESS | 2019年 / 9卷 / 04期

基金：

俄罗斯科学基金会;

关键词：

COATINGS; ZNSE; LITHOGRAPHY; SURFACES; FILMS;

D O I：

10.1364/OME.9.001689

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A Yb femtosecond laser was used to fabricate antireflective microstructures on CdSSe single crystal samples. We investigated several microstructure fabrication methods, including direct single pulse ablation using 200 fs pulses, ablation with in-depth focusing, ablation in the presence of additional spherical aberration and ablation with obstruction of peripheral rays. We performed a comprehensive analysis of the implemented antireflection microstructure fabrication methods. The performances of the antireflection microstructures were measured using an infrared Fourier spectrum analyzer and the best samples demonstrated >99% transmission in the 4.5-6 mu m range and average transmission near 97% in range from 2.7 to 8 mu m. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement

引用

页码：1689 / 1697

页数：9

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