Environmental challenges in nanoelectronics manufacturing

被引:5
作者
Shadman, Farhang [1 ]
机构
[1] Univ Arizona, SRC Engn Res Ctr, Tucson, AZ 85721 USA
关键词
ZIRCONIUM-OXIDE; NANOPARTICLES; NANOMATERIALS; HEALTH; MICRO;
D O I
10.1016/j.coche.2012.03.004
中图分类号
Q81 [生物工程学(生物技术)]; Q93 [微生物学];
学科分类号
071005 ; 0836 ; 090102 ; 100705 ;
摘要
Manufacturing in nanoscale is not a simple extrapolation of the current and conventional manufacturing practices. The shift to nanoscale creates both major issues as well as significant opportunities in performance, cost, and environmental impact for the electronics industry. This article focuses on both the positive and the negative environmental impacts of this inevitable paradigm change. The inter-relationship between the three sustainability factors (performance, cost, and environmental impact) for future electronics manufacturing will be analyzed. In particular, the challenges related to resource requirements and utilization (water, energy, and chemicals) are discussed. Examples of unique opportunities for environmental gain that nanoscale manufacturing can provide are presented.
引用
收藏
页码:258 / 268
页数:11
相关论文
共 28 条
[1]   Towards a definition of inorganic nanoparticles from an environmental, health and safety perspective [J].
Auffan, Melanie ;
Rose, Jerome ;
Bottero, Jean-Yves ;
Lowry, Gregory V. ;
Jolivet, Jean-Pierre ;
Wiesner, Mark R. .
NATURE NANOTECHNOLOGY, 2009, 4 (10) :634-641
[2]   High refractive index and high transparency HfO2 nanocomposites for next generation lithography [J].
Bae, Woo Jin ;
Trikeriotis, Markos ;
Sha, Jing ;
Schwartz, Evan L. ;
Rodriguez, Robert ;
Zimmerman, Paul ;
Giannelis, Emmanuel P. ;
Ober, Christopher K. .
JOURNAL OF MATERIALS CHEMISTRY, 2010, 20 (25) :5186-5189
[3]   Application of surface chemical analysis tools for characterization of nanoparticles [J].
Baer, D. R. ;
Gaspar, D. J. ;
Nachimuthu, P. ;
Techane, S. D. ;
Castner, D. G. .
ANALYTICAL AND BIOANALYTICAL CHEMISTRY, 2010, 396 (03) :983-1002
[4]   Wet etching of heat treated atomic layer chemical vapor deposited zirconium oxide in HF based solutions [J].
Balasubramanian, Sriram ;
Raghavan, Srini .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (06) :4502-4504
[5]   Will future measurement needs of the semiconductor industry be met? [J].
Bennett, Herbert S. .
JOURNAL OF RESEARCH OF THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY, 2007, 112 (01) :25-38
[6]   The impact of different nanoparticle surface chemistry and size on uptake and toxicity in a murine macrophage cell line [J].
Clift, Martin J. D. ;
Rothen-Rutishauser, Barbara ;
Brown, David M. ;
Duffin, Rodger ;
Donaldson, Ken ;
Proudfoot, Lorna ;
Guy, Keith ;
Stone, Vicki .
TOXICOLOGY AND APPLIED PHARMACOLOGY, 2008, 232 (03) :418-427
[7]   Dynamics of Cleaning and Rinsing of Micro and Nano Structures in Single-Wafer Cleaning Tools [J].
Dhane, Kedar ;
Han, Jeongnam ;
Yan, Jun ;
Mahdavi, Omid ;
Zamani, Davoud ;
Vermeire, Bert ;
Shadman, Farhang .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2011, 24 (01) :125-133
[8]   Cytotoxicity and physicochemical properties of hafnium oxide nanoparticles [J].
Field, James A. ;
Luna-Velasco, Antonia ;
Boitano, Scott A. ;
Shadman, Farhang ;
Ratner, Buddy D. ;
Barnes, Chris ;
Sierra-Alvarez, Reyes .
CHEMOSPHERE, 2011, 84 (10) :1401-1407
[9]   Physico-chemical features of engineered nanoparticles relevant to their toxicity [J].
Fubini, Bice ;
Ghiazza, Mara ;
Fenoglio, Ivana .
NANOTOXICOLOGY, 2010, 4 (04) :347-363
[10]   Immersion lithography: New opportunities for semiconductor manufacturing [J].
Gil, D ;
Brunner, TA ;
Fonseca, C ;
Seong, N ;
Streefkerk, B ;
Wagner, C ;
Stavenga, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06) :3431-3438