Frequency scanning interferometry immune to length drift using a pair of vertical-cavity surface-emitting laser diodes

被引:38
作者
Kakuma, Seiichi [1 ]
Katase, Yasuhiko [1 ]
机构
[1] Hokkaido Univ, Grad Sch Engn, Div Appl Phys, Sapporo, Hokkaido 0608628, Japan
基金
日本学术振兴会;
关键词
VCSEL; frequency scanning interferometry; length drift; absolute length; WAVELENGTH; PROFILOMETRY;
D O I
10.1007/s10043-012-0061-3
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In laser frequency scanning interferometry for measurements of absolute lengths, a small drift in the measured length during the frequency scan yields an enlarged offset error in the measured result. Although such an error is unavoidable for an on-site interferometric system, methods for solving this problem have not been developed. We propose a frequency scanning interferometric system immune to the dynamic length change employing a pair of vertical-cavity surface-emitting laser diodes whose frequencies are equally scanned in opposite directions. The offset error is canceled by averaging the two phase shifts of the interferograms obtained from the light sources.
引用
收藏
页码:376 / 380
页数:5
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