Free-standing spectral purity filters for extreme ultraviolet lithography

被引：37

作者：

Chkhalo, Nikolay I. ^{[1
]}

Drozdov, Mikhail N. ^{[1
]}

Kluenkov, Evgeny B. ^{[1
]}

Lopatin, Aleksei Ya. ^{[1
]}

Luchin, Valerii I. ^{[1
]}

Salashchenko, Nikolay N. ^{[1
]}

Tsybin, Nikolay N. ^{[1
]}

Sjmaenok, Leonid A. ^{[2
]}

Banine, Vadim E. ^{[3
]}

Yakunin, Andrei M. ^{[3
]}

机构：

[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod, Russia

[2] PhysTeX, Vaals, Netherlands

[3] ASML, Veldhoven, Netherlands

来源：

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 2012年 / 11卷 / 02期

关键词：

free-standing multilayer film; spectral purity filter; extreme ultraviolet lithography; MULTILAYER MIRRORS; FABRICATION;

D O I：

10.1117/1.JMM.11.2.021115

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Free-standing multilayer films consisting of Si, Zr, Mo and silicides of both metals have been fabricated and studied as spectral purity filters (SPF) for extreme ultraviolet (EUV) (13.5 nm) lithography tools. Comparative tests of multilayer SPF structures of various compositions have been performed at high power loads. It was found that a Mo/ZrSi2 structure with MoSi2 capping layers is featured with capability to withstand prolonged heating in vacuum (10(-7) mbar) at 900-950 degrees C. A technique of fabrication of large aperture free-standing multilayers was developed, and a pilot sample of the above film structure of 160 mm in diameter, 50 nm thick, with transparency at 13.5 nm above 70% was fabricated as a conceptual prototype of SPFs with large dimensions. (c) 2012 Society of Photo-Optical Instrumentation Engineers (SPIE). [DOI: 10.1117/1.JMM.11.2.021115]

引用

页数：7

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