Ab initio study of charge trapping and dielectric properties of Ti-doped HfO2

被引:11
作者
Munoz Ramo, D. [1 ,3 ]
Shluger, A. L. [1 ,3 ,4 ]
Bersuker, G. [2 ]
机构
[1] UCL, Dept Phys & Astron, London WC1E 6BT, England
[2] SEMATECH, Austin, TX 78741 USA
[3] London Ctr Nanotechnol, London WC1E 6BT, England
[4] Tohoku Univ, WPI Adv Inst Mat Res, Aoba Ku, Sendai, Miyagi 9808577, Japan
基金
英国工程与自然科学研究理事会;
关键词
ab initio calculations; band structure; conduction bands; density functional theory; electron traps; hafnium compounds; hole traps; permittivity; soft modes; titanium; HYBRID DENSITY FUNCTIONALS; METAL-OXIDES; PERFORMANCE; POTENTIALS; FILMS;
D O I
10.1103/PhysRevB.79.035306
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electronic structure and relative stability of monoclinic, tetragonal, and cubic phases of HfO2 with Ti doping in the range of 3.125%-37.5% are studied by means of first-principles calculations. The dielectric response, and electron and hole trapping properties of Ti-doped monoclinic HfO2 are calculated using a hybrid density-functional B3LYP. The incorporation of Ti into HfO2 induces higher polarizability of Hf and O ions, accompanied by an increase in the static dielectric constant and softening of phonon modes. However, the Ti ions serve as deep electron traps inducing localized levels in the gap and, at high Ti concentrations, the HfO2 conduction-band offset with Si is effectively reduced by about 1.5 eV.
引用
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页数:8
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