Near-field optical photomask repair with a femtosecond laser

被引：0

作者：

Lieberman, K ^{[1
]}

Shani, Y ^{[1
]}

Melnik, I ^{[1
]}

Yoffe, S ^{[1
]}

Sharon, Y ^{[1
]}

机构：

[1] Nanon Lithog Ltd, IL-91487 Jerusalem, Israel

来源：

JOURNAL OF MICROSCOPY-OXFORD | 1999年 / 194卷

关键词：

laser ablation; near-field optics; photomask repair;

D O I：

暂无

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

We present a high-resolution near-field optical tool designed for repair of opaque defects in binary photomasks. Both instrument design and near-field imaging and patterning results will be presented, Designed for ablative processing of thin metal films, the MR-100 incorporates an industrial amplified femtosecond laser, third harmonic generator and built-in autocorrelator. The ultrashort duration of the femtosecond pulses enables the tool to remove chrome layers with negligible damage to the surrounding metal or the underlying quartz substrate. The micropipette based near-field writing head can deliver power densities of hundreds of GW/cm(2) to spots of several hundred nanometres and below Repairs on sample masks will be presented and the repair quality will be discussed.

引用

页码：537 / 541

页数：5

共 5 条

[1] High resolution deep UV laser mask repair based on near-field optical technology [J].

Lieberman, K ;

Terkel, H ;

Rudman, M ;

Ignatov, A ;

Lewis, A .

PHOTOMASK AND X-RAY MASK TECHNOLOGY III, 1996, 2793 :481-488

[2]

LIEBERMAN K, 1999, IN PRESS ULTRAMICROS

[3]

LIEBERMAN K, 1997, MICROLITHOGRAPHY WOR

[4] Ablation of metals by ultrashort laser pulses [J].

Nolte, S ;

Momma, C ;

Jacobs, H ;

Tunnermann, A ;

Chichkov, BN ;

Wellegehausen, B ;

Welling, H .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1997, 14 (10) :2716-2722

[5]

RUDMAN M, 1994, SPIE P, V2197

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