Fabrication and Characteristics of an nc-Si/c-Si Heterojunction MOSFETs Pressure Sensor

被引:16
作者
Zhao, Xiaofeng [1 ]
Wen, Dianzhong [1 ]
Li, Gang [1 ]
机构
[1] Heilongjiang Univ, Coll Heilongjiang Prov, Major Labs Integrated Circuits, Key Lab Elect Engn, Harbin 150080, Peoples R China
基金
中国国家自然科学基金;
关键词
nc-Si/c-Si heterojunction; MOSFETs pressure sensor; MEMS technology; CMOS process; SENSITIVITY; VOLTAGE;
D O I
10.3390/s120506369
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
A novel nc-Si/c-Si heterojunction MOSFETs pressure sensor is proposed in this paper, with four p-MOSFETs with nc-Si/c-Si heterojunction as source and drain. The four p-MOSFETs are designed and fabricated on a square silicon membrane by CMOS process and MEMS technology where channel resistances of the four nc-Si/c-Si heterojunction MOSFETs form a Wheatstone bridge. When the additional pressure is P, the nc-Si/c-Si heterojunction MOSFETs pressure sensor can measure this additional pressure P. The experimental results show that when the supply voltage is 3 V, length-width ( L: W) ratio is 2: 1, and the silicon membrane thickness is 75 mu m, the full scale output voltage of the pressure sensor is 15.50 mV at room temperature, and pressure sensitivity is 0.097 mV/kPa. When the supply voltage and L: W ratio are the same as the above, and the silicon membrane thickness is 45 mu m, the full scale output voltage is 43.05 mV, and pressure sensitivity is 2.153 mV/kPa. Therefore, the sensor has higher sensitivity and good temperature characteristics compared to the traditional piezoresistive pressure sensor.
引用
收藏
页码:6369 / 6379
页数:11
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