Fabrication of PDMS Nano-stamp by Replicating Si Nano-moulds Fabricated by Interference Lithography

被引：4

作者：

Byun, Ikjoo ^{[1
]}

Park, Jongho ^{[1
]}

Kim, Joonwon ^{[2
]}

Kim, Beomjoon ^{[1
]}

机构：

[1] Univ Tokyo, CIRMM, IIS, Tokyo, Japan

[2] POSTECH, Dept Engn Mech, Pohang, South Korea

来源：

PROCEEDINGS OF PRECISION ENGINEERING AND NANOTECHNOLOGY (ASPEN2011) | 2012年 / 516卷

关键词：

nano-contact printing (nCP); self-assembled monolayer (SAM); interference lithography (IL); superhydrophobic surfaces; SELF-ASSEMBLED MONOLAYER; SOLVENT;

D O I：

10.4028/www.scientific.net/KEM.516.25

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this research, a polydimethylsiloxane nano-stamp for nano-contact printing was fabricated by replicating Si nano-moulds. Si moulds of various shapes and sizes were fabricated by interference lithography and deep reactive ion etching. As an anti-adhesion layer, octadecyltrichlorosilane was treated on Si nano-moulds. Further, superhydrophobic surfaces were obtained by self-assembled monolayer treatment on Si nano-structures.

引用

页码：25 / +

页数：3

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