Surface Potential based modeling of Sheet Charge Density and Estimation of Critical Barrier Thickness in AlGaN/GaN HEMT

被引:9
作者
Chakrabarty, A. [1 ]
Panda, A. K. [2 ]
Swain, R. [3 ]
机构
[1] Siksha O Anusandhan Deemed Be Univ, Dept Elect & Commun Engn, ITER, Bhubaneswar 751030, Odisha, India
[2] Natl Inst Sci & Technol, Dept Elect & Commun Engn, Berhampur 761008, Odisha, India
[3] Parala Maharaja Engn Coll, Dept Elect & Telecommun, Berhampur 761003, Odisha, India
来源
2019 IEEE 16TH INDIA COUNCIL INTERNATIONAL CONFERENCE (IEEE INDICON 2019) | 2019年
关键词
2DEG; Critical thickness; HEMT; Surface donor; PIEZOELECTRIC POLARIZATION; LAYER;
D O I
10.1109/indicon47234.2019.9030295
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
The two dimensional electron gas (2DEG) density in AlGaN/GaN HEMT is modeled by considering surface potential of barrier layer. The critical thickness is calculated to be 3.3nm for Al0.27Ga0.73N/GaN HEMT which is in agreement with the experimentally observed value of 3nm for the same mole fraction of Al. The model also depicts that, critical barrier thickness decreases with increase in Al mole fraction.
引用
收藏
页数:4
相关论文
共 13 条
  • [1] Alshref MA., 2013, IEEE T ELECTRON DEV, V60, P3216
  • [2] Pyroelectric properties of Al(In)GaN/GaN hetero- and quantum well structures
    Ambacher, O
    Majewski, J
    Miskys, C
    Link, A
    Hermann, M
    Eickhoff, M
    Stutzmann, M
    Bernardini, F
    Fiorentini, V
    Tilak, V
    Schaff, B
    Eastman, LF
    [J]. JOURNAL OF PHYSICS-CONDENSED MATTER, 2002, 14 (13) : 3399 - 3434
  • [3] Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures
    Ambacher, O
    Smart, J
    Shealy, JR
    Weimann, NG
    Chu, K
    Murphy, M
    Schaff, WJ
    Eastman, LF
    Dimitrov, R
    Wittmer, L
    Stutzmann, M
    Rieger, W
    Hilsenbeck, J
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 85 (06) : 3222 - 3233
  • [4] Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures
    Ambacher, O
    Foutz, B
    Smart, J
    Shealy, JR
    Weimann, NG
    Chu, K
    Murphy, M
    Sierakowski, AJ
    Schaff, WJ
    Eastman, LF
    Dimitrov, R
    Mitchell, A
    Stutzmann, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (01) : 334 - 344
  • [5] NEW APPROACH IN EQUILIBRIUM-THEORY FOR STRAINED-LAYER RELAXATION
    FISCHER, A
    KUHNE, H
    RICHTER, H
    [J]. PHYSICAL REVIEW LETTERS, 1994, 73 (20) : 2712 - 2715
  • [6] Polarization effects in AlGaN/GaN and GaN/AlGaN/GaN heterostructures
    Heikman, S
    Keller, S
    Wu, Y
    Speck, JS
    DenBaars, SP
    Mishra, UK
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 93 (12) : 10114 - 10118
  • [7] Polarization effects, surface states, and the source of electrons in AlGaN/GaN heterostructure field effect transistors
    Ibbetson, JP
    Fini, PT
    Ness, KD
    DenBaars, SP
    Speck, JS
    Mishra, UK
    [J]. APPLIED PHYSICS LETTERS, 2000, 77 (02) : 250 - 252
  • [8] Recessed-gate enhancement-mode GaNHEMT with high threshold voltage
    Lanford, WB
    Tanaka, T
    Otoki, Y
    Adesida, I
    [J]. ELECTRONICS LETTERS, 2005, 41 (07) : 449 - 450
  • [9] Enhancement-Mode Operation of Nanochannel Array (NCA) AlGaN/GaN HEMTs
    Liu, Shenghou
    Cai, Yong
    Gu, Guodong
    Wang, Jinyan
    Zeng, Chunhong
    Shi, Wenhua
    Feng, Zhihong
    Qin, Hua
    Cheng, Zhiqun
    Chen, Kevin J.
    Zhang, Baoshun
    [J]. IEEE ELECTRON DEVICE LETTERS, 2012, 33 (03) : 354 - 356
  • [10] DEFECTS IN EPITAXIAL MULTILAYERS .3. PREPARATION OF ALMOST PERFECT MULTILAYERS
    MATTHEWS, JW
    BLAKESLEE, AE
    [J]. JOURNAL OF CRYSTAL GROWTH, 1976, 32 (02) : 265 - 273