Effect of dilution gas on hardness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure plasma enhanced CVD

被引：1

作者：

Noborisaka, M. ^{[1
]}

Tachimoto, Y. ^{[1
]}

Horikoshi, R. ^{[1
]}

Shirakura, A. ^{[1
]}

Suzuki, T. ^{[1
]}

机构：

[1] Keio Univ, Ctr Sci Environm Resources & Energy, Kohoku Ku, Yokohama, Kanagawa 223, Japan

来源：

15TH INTERNATIONAL CONFERENCE ON THIN FILMS (ICTF-15) | 2013年 / 417卷

关键词：

DIAMOND-LIKE CARBON; CHEMICAL-VAPOR-DEPOSITION; AIR;

D O I：

10.1088/1742-6596/417/1/012044

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The deposition of hydrogenated amorphous carbon (a-C:H)-based films at atmospheric pressure is a cost-effective process without using a high-vacuum technique. In this study, we synthesized a-C: H-based films by atmospheric pressure-plasma enhanced CVD method from C2H2/He and C2H2/N-2 mixture gas and investigated the effect of dilution gas on the hardness of the films. The film deposited from C2H2/N-2 contained nitrogen elements with forming C-N bonds and the film was softer than a-C: H film deposited from C2H2/He. The hardness of the film deposited from C2H2/He was 1.1 GPa and twice higher than that from C2H2/N-2.

引用

页数：5

共 10 条

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