Luminescence of unfused 95%SiO2-5%GeO2 amorphous films with fluorine additive: No evidence for presence of GeODC(I) defects found

被引:5
|
作者
Trukhin, A. N. [1 ]
Golant, K. M. [2 ]
Teteris, J. [1 ]
机构
[1] Univ Latvia, Inst Solid State Phys, LV-1063 Riga, Latvia
[2] RAS, Kotelnikov Inst Radioengn & Elect, Moscow 125009, Russia
关键词
Silica with germanium and fluorine; Time resolved luminescence; OPTICAL-ABSORPTION; SILICA; BAND;
D O I
10.1016/j.jnoncrysol.2013.02.015
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Photoluminescence (PL) of unfused amorphous germanosilicate films with fluorine additive is studied in 2-8.5 eV spectral range. Experiments are based on films deposited on silica substrates by means of the surface-plasma chemical vapor deposition (SPCVD). Films of about 100 gm in thickness with "high F' (similar to 4.2 wt.%) and "low F" (similar to 0.5 wt.%) fluorine content have been fabricated for the experiments. KrF (248 nm), ArF (193 nm) and F-2 (157 nm) excimer lasers are used to pump PL. It is found that absorption and luminescence associated with germanium oxygen deficient centers (GeODCs) in "high F" and "low F" films differ. In the "high F' unfused film absorption coefficient of the band at 5 eV as well as intensity of the blue PL band at 3.1 eV are significantly greater. This film proves features of the so called GeODCs(II), which symbolize twofold coordinated germanium defects in silica network. In the "low F' unfused film absorption band at 5 eV is feebly marked. Poorly resolved PL intrinsic to GeODCs(II) can be detected in this film under the KrF laser pump. The most significant PL features are revealed under deeper UV pump by ArF and F2 lasers. Spectral positions of PL bands excited by these lasers correspond to GeODCs(II). However PL decay kinetics dramatically differs from that one intrinsic to GeODCs(II). Noticeable growth of PL intensity caused by permanent (half an hour and more) exposure to ArF and/or F-2 lasers takes place, indicating GeODC(II) formation. It is found that considerable body of fluorine additive has the same effect as profusion for "low F' and/or fluorine free germanosilicate amorphous material synthesized by SPCVD. In the "high F" film yield of GeODC(II) PL pumped by the F2 laser remains high. This speaks for the suppression of the competitive 7.6 eV absorption band associated with SiODCs(I) by fluorine additive indicating a decrease in the content of this type of defects in the material. High yield of GeODC(II) luminescence pumped by deep UV photons as well as hypothetical similarity of SiODC(I) and GeODC(I) permit one to conclude that GeODCs(II) are the only defects dominating in the materials under study. (C) 2013 Elsevier B.V. All rights reserved.
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页码:53 / 57
页数:5
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