Disconnection description of triple-junction motion

被引:63
作者
Thomas, Spencer L. [1 ]
Wei, Chaozhen [2 ,3 ]
Han, Jian [1 ]
Xiang, Yang [2 ]
Srolovitz, David J. [1 ,4 ,5 ]
机构
[1] Univ Penn, Dept Mat Sci & Engn, 3231 Walnut St, Philadelphia, PA 19104 USA
[2] Hong Kong Univ Sci & Technol, Dept Math, Kowloon, Hong Kong, Peoples R China
[3] Hong Kong Univ Sci & Technol, Inst Adv Study, Kowloon, Hong Kong, Peoples R China
[4] Univ Penn, Dept Mech Engn & Appl Mech, Philadelphia, PA 19104 USA
[5] City Univ Hong Kong, Dept Mat Sci & Engn, Hong Kong, Peoples R China
关键词
materials science; metals; microstructure evolution; grain boundary migration; molecular dynamics; TILT GRAIN-BOUNDARIES; MOLECULAR-DYNAMICS; SLIDING MECHANISMS; GROWTH KINETICS; SYMMETRIC TILT; MIGRATION; DISLOCATIONS; SHEAR; SIMULATION; STEPS;
D O I
10.1073/pnas.1820789116
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Grain boundary (GB) migration in polycrystalline materials necessarily implies the concurrent motion of triple junctions (TJs), the lines along which three GBs meet. Today, we understand that GB migration occurs through the motion of disconnections in the GB plane (line defects with both step and dislocation character). We present evidence from molecular dynamics grain growth simulations and idealized microstructures that demonstrates that TJ motion and GB migration are coupled through disconnection dynamics. Based on these results, we develop a theory of coupled GB/TJ migration and use it to develop a physically based, disconnection mechanism-specific continuum model of microstructure evolution. The continuum approach provides a means of reducing the complexity of the discrete disconnection picture to extract the features of disconnection dynamics that are important for microstructure evolution. We implement this model in a numerical, continuum simulation and demonstrate that it is capable of reproducing the molecular dynamics (MD) simulation results.
引用
收藏
页码:8756 / 8765
页数:10
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