Growth of High-Quality Hexagonal Boron Nitride Single-Layer Films on Carburized Ni Substrates for Metal-Insulator-Metal Tunneling Devices

被引:11
作者
He, Yanwei [1 ]
Tian, Hao [1 ]
Das, Protik [1 ]
Cui, Zhenjun [1 ]
Pena, Pedro [1 ]
Chiang, Ivan [1 ]
Shi, Wenhao [1 ]
Xu, Long [1 ]
Li, Yuan [1 ]
Yang, Tianchen [1 ]
Isarraraz, Miguel [1 ]
Ozkan, Cengiz S. [2 ,3 ]
Ozkan, Mihrimah [1 ]
Lake, Roger K. [1 ]
Liu, Jianlin [1 ]
机构
[1] Univ Calif Riverside, Dept Elect & Comp Engn, Riverside, CA 92521 USA
[2] Univ Calif Riverside, Mat Sci & Engn Program, Riverside, CA 92521 USA
[3] Univ Calif Riverside, Dept Mech Engn, Riverside, CA 92521 USA
基金
美国国家科学基金会;
关键词
hexagonal boron nitride (h-BN); molecular beam epitaxy (MBE); substrate engineering; two-dimensional (2D); electrical device; FIELD-EFFECT TRANSISTORS; DIELECTRIC-BREAKDOWN; GRAPHENE; EXFOLIATION; TEMPERATURE; DEPOSITION; TRANSPORT; IMAGE;
D O I
10.1021/acsami.0c07201
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Two-dimensional (2D) hexagonal boron nitride (h-BN) plays a significant role in nanoscale electrical and optical devices because of its superior properties. However, the difficulties in the controllable growth of high-quality films hinder its applications. One of the crucial factors that influence the quality of the films obtained via epitaxy is the substrate property. Here, we report a study of 2D h-BN growth on carburized Ni substrates using molecular beam epitaxy. It was found that the carburization of Ni substrates with different surface orientations leads to different kinetics of h-BN growth. While the carburization of Ni(100) enhances the h-BN growth, the speed of the h-BN growth on carburized Ni(111) reduces. Asgrown continuous single-layer h-BN films are used to fabricate Ni/h-BN/Ni metal-insulator-metal (MIM) devices, which demonstrate a high breakdown electric field of 12.9 MV/cm.
引用
收藏
页码:35318 / 35327
页数:10
相关论文
共 66 条
[41]   Highly Monochromatic Electron Emission from Graphene/Hexagonal Boron Nitride/Si Heterostructure [J].
Murakami, Katsuhisa ;
Igari, Tomoya ;
Mitsuishi, Kazutaka ;
Nagao, Masayoshi ;
Sasaki, Masahiro ;
Yamada, Yoichi .
ACS APPLIED MATERIALS & INTERFACES, 2020, 12 (03) :4061-4067
[42]   Synthesis of atomically thin hexagonal boron nitride films on nickel foils by molecular beam epitaxy [J].
Nakhaie, S. ;
Wofford, J. M. ;
Schumann, T. ;
Jahn, U. ;
Ramsteiner, M. ;
Hanke, M. ;
Lopes, J. M. J. ;
Riechert, H. .
APPLIED PHYSICS LETTERS, 2015, 106 (21)
[43]   Electric field effect in atomically thin carbon films [J].
Novoselov, KS ;
Geim, AK ;
Morozov, SV ;
Jiang, D ;
Zhang, Y ;
Dubonos, SV ;
Grigorieva, IV ;
Firsov, AA .
SCIENCE, 2004, 306 (5696) :666-669
[44]   Model for multi-filamentary conduction in graphene/hexagonal-boron-nitride/graphene based resistive switching devices [J].
Pan, Chengbin ;
Miranda, Enrique ;
Villena, Marco A. ;
Xiao, Na ;
Jing, Xu ;
Xie, Xiaoming ;
Wu, Tianru ;
Hui, Fei ;
Shi, Yuanyuan ;
Lanza, Mario .
2D MATERIALS, 2017, 4 (02)
[45]  
Perdew JP, 1996, PHYS REV LETT, V77, P3865, DOI 10.1103/PhysRevLett.77.3865
[46]   Van der Waals epitaxy of two-dimensional single-layer h-BN on graphite by molecular beam epitaxy: Electronic properties and band structure [J].
Pierucci, Debora ;
Zribi, Jihene ;
Henck, Hugo ;
Chaste, Julien ;
Silly, Mathieu G. ;
Bertran, Francois ;
Le Fevre, Patrick ;
Gil, Bernard ;
Summerfield, Alex ;
Beton, Peter H. ;
Novikov, Sergei V. ;
Cassabois, Guillaume ;
Rault, Julien E. ;
Ouerghi, Abdelkarim .
APPLIED PHYSICS LETTERS, 2018, 112 (25)
[47]   NIH Image to ImageJ: 25 years of image analysis [J].
Schneider, Caroline A. ;
Rasband, Wayne S. ;
Eliceiri, Kevin W. .
NATURE METHODS, 2012, 9 (07) :671-675
[48]   Edge controlled growth of hexagonal boron nitride crystals on copper foil by atmospheric pressure chemical vapor deposition [J].
Sharma, Kamal Prasad ;
Sharma, Subash ;
Sharma, Aliza Khaniya ;
Jaisi, Balaram Paudel ;
Kalita, Golap ;
Tanemura, Masaki .
CRYSTENGCOMM, 2018, 20 (05) :550-555
[50]   Synthesis of Few-Layer Hexagonal Boron Nitride Thin Film by Chemical Vapor Deposition [J].
Shi, Yumeng ;
Hamsen, Christoph ;
Jia, Xiaoting ;
Kim, Ki Kang ;
Reina, Alfonso ;
Hofmann, Mario ;
Hsu, Allen Long ;
Zhang, Kai ;
Li, Henan ;
Juang, Zhen-Yu ;
Dresselhaus, Mildred. S. ;
Li, Lain-Jong ;
Kong, Jing .
NANO LETTERS, 2010, 10 (10) :4134-4139