X-ray diffraction, Raman and photoluminescence studies of nanocrystalline cerium oxide thin films

被引:68
作者
Balakrishnan, G. [1 ]
Raghavan, C. M. [2 ]
Ghosh, C. [3 ]
Divakar, R. [3 ]
Mohandas, E. [3 ]
Song, Jung Il [1 ]
Bae, S. I. [1 ]
Kim, Tae Gyu [4 ]
机构
[1] Changwon Natl Univ, Dept Mech Engn, Chang Won 641773, South Korea
[2] Changwon Natl Univ, Dept Phys, Ferroelect Thin Film Lab, Chang Won 641773, South Korea
[3] Indira Gandhi Ctr Atom Res, Phys Met Grp, Mat Synth & Struct Characterisat Sect, Kalpakkam 603102, Tamil Nadu, India
[4] Pusan Natl Univ, Dept Nanomechatron Engn, Miryang 627706, South Korea
基金
新加坡国家研究基金会;
关键词
X-ray diffraction; Thin films; Cerium oxide; Raman spectroscopy; Photoluminescence; OPTICAL-PROPERTIES; STRUCTURAL-PROPERTIES; CEO2; FILMS; GROWTH; TEMPERATURE; DEPOSITION; DIOXIDE; LAYERS;
D O I
10.1016/j.ceramint.2013.03.103
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Cerium oxide (CeO2) thin films were deposited on Si (100) and glass substrates at various oxygen partial pressures (2 x 10(-5) mbar-3 x 10(-1) mbar) and a substrate temperature of 673 K, by pulsed laser deposition (PLD). The structural, morphological and optical properties of the films were characterized by X-ray diffraction, Raman spectroscopy, high resolution transmission electron microscopy, atomic force microscopy, photoluminescence and UV-visible spectroscopy. XRD analysis revealed the polycrystalline and cubic structure of the CeO2 films with preferred orientation for (200) as the increase of oxygen partial pressure. The Raman studies indicated the formation of Ce-O with the systematic variation of peak intensity and FWHM with oxygen partial pressures. The high resolution transmission electron microscopy investigation confirmed the polycrystalline and cubic nature of the CeO2 films with (200) preferred orientation. The AFM studies showed the roughness (RIMS) values of the films increased from 0.8 nm to 4.6 nm with increasing oxygen partial pressure from 2 x 10(-5) mbar to 3 x 10(-1) mbar. The photoluminescence (PL) investigation indicated the bandgap values in the range 3.05-3.10 eV with increasing oxygen partial pressures. The UV-visible spectroscopy analysis demonstrated that the refractive index of the films decreased from 2.41 to 1.72 with increasing oxygen partial pressures. (C) 2013 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
引用
收藏
页码:8327 / 8333
页数:7
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