Growth regimes of porous gold thin films deposited by magnetron sputtering at oblique incidence: from compact to columnar microstructures

被引：81

作者：

Alvarez, R. ^{[1
]}

Garcia-Martin, J. M. ^{[2
]}

Macias-Montero, M. ^{[1
]}

Gonzalez-Garcia, L. ^{[1
]}

Gonzalez, J. C. ^{[1
]}

Rico, V. ^{[1
]}

Perlich, J. ^{[3
]}

Cotrino, J. ^{[1
,4
]}

Gonzalez-Elipe, A. R. ^{[1
]}

Palmero, A. ^{[1
]}

机构：

[1] Inst Ciencia Mat Sevilla CSIC US, E-41092 Seville, Spain

[2] IMM Inst Microelect Madrid CNM CSIC, E-28760 Madrid, Spain

[3] DESY, HASYLAB, D-22603 Hamburg, Germany

[4] Univ Seville, Dept Fis Atom Mol & Nucl, E-41071 Seville, Spain

来源：

NANOTECHNOLOGY | 2013年 / 24卷 / 04期

关键词：

TEMPERATURE;

D O I：

10.1088/0957-4484/24/4/045604

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Growth regimes of gold thin films deposited by magnetron sputtering at oblique angles and low temperatures are studied from both theoretical and experimental points of view. Thin films were deposited in a broad range of experimental conditions by varying the substrate tilt angle and background pressure, and were analyzed by field emission scanning electron microscopy and grazing-incidence small-angle x-ray scattering techniques. Results indicate that the morphological features of the films strongly depend on the experimental conditions, but can be categorized within four generic microstructures, each of them defined by a different bulk geometrical pattern, pore percolation depth and connectivity. With the help of a growth model, a microstructure phase diagram has been constructed where the main features of the films are depicted as a function of experimentally controllable quantities, finding a good agreement with the experimental results in all the studied cases. Online supplementary data available from stacks.iop.org/Nano/24/045604/mmedia

引用

页数：9

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