Characterization of thin film adhesion by MEMS shaft-loading blister testing

被引:16
作者
Berdova, Maria [1 ,2 ]
Lyytinen, Jussi [1 ]
Grigoras, Kestutis [3 ]
Baby, Anu [1 ,2 ]
Kilpi, Lauri [3 ]
Ronkainen, Helena [3 ]
Franssila, Sami [1 ,2 ]
Koskinen, Jari [1 ]
机构
[1] Aalto Univ, Dept Mat Sci & Engn, Aalto 00076, Finland
[2] Aalto Univ, Micronova Nanofabricat Ctr, Aalto 00076, Finland
[3] VTT Tech Res Ctr Finland, FI-02044 Espoo, Finland
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2013年 / 31卷 / 03期
关键词
16;
D O I
10.1116/1.4801921
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A new microelectromechanical system shaft-loaded blister test was developed and demonstrated to provide stability, repeatability, and simultaneous quantitative measurements of adhesion between thin films deposited on a silicon substrate. The authors assessed adhesion of sputtered platinum, copper, and chromium/copper (300 nm) to underlaying atomic layer deposited (ALD) aluminum oxide. The average adhesion energies for thin films on ALD aluminum oxide were found to be 1.15 +/- 0.1 J/m(2) for platinum thin films, 1.4 J/m(2) for copper thin films, and 1.75 J/m(2) for chromium/copper. (C) 2013 American Vacuum Society.
引用
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页数:5
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