In-Pixel Source Follower Transistor RTS Noise Behavior Under Ionizing Radiation in CMOS Image Sensors

被引:16
作者
Martin-Gonthier, Philippe [1 ]
Goiffon, Vincent [1 ]
Magnan, Pierre [1 ]
机构
[1] Univ Toulouse, Inst Super Aeronaut & Espace, CIMI Integrated Image Sensor Lab, F-31055 Toulouse, France
关键词
Active-pixel sensor; CMOS image sensors (CISs); correlated double sampling (CDS); ionizing radiation; low-frequency noise (LFN); noisy pixels; random telegraph signal (RTS) noise; RANDOM TELEGRAPH SIGNAL; 1/F NOISE; ARCHITECTURE; SENSITIVITY;
D O I
10.1109/TED.2012.2189115
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents temporal noise measurement results for several total ionizing dose (TID) steps up to 2.19 Mrad of an image sensor designed with a 0.18-mu m CMOS image sensor process. The noise measurements are focused on the random telegraph signal (RTS) noise due to the in-pixel source follower transistor of the sensor readout chain inducing noisy pixels. Results show no significant RTS noise degradation up to 300 krad of TID. Beyond this TID step, a limited RTS noise degradation is observed, and for the 2.19-Mrad step, an additional increase of total noise, including thermal, 1/f, and RTS noises, is noted. Noisy pixels have been studied for high TIDs, and three cases have been observed: 1) no change on RTS behavior; 2) creation of RTS behavior; and 3) modifications of RTS behavior.
引用
收藏
页码:1686 / 1692
页数:7
相关论文
共 21 条
[1]   In-Pixel Buried-Channel Source Follower in CMOS Image Sensors Exposed to X-Ray Radiation [J].
Chen, Yue ;
Tan, Jiaming ;
Wang, Xinyang ;
Mierop, Adri J. ;
Theuwissen, Albert J. P. .
2010 IEEE SENSORS, 2010, :1649-1652
[2]   A Low Noise Pixel Architecture for Scientific CMOS Monolithic Active Pixel Sensors [J].
Coath, Rebecca E. ;
Crooks, Jamie P. ;
Godbeer, Adam ;
Wilson, Matthew D. ;
Zhang, Zhige ;
Stanitzki, Marcel ;
Tyndel, Mike ;
Turchetta, Renato A. D. .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2010, 57 (05) :2490-2496
[3]   Source follower noise limitations in CMOS active pixel sensors [J].
Findlater, KM ;
Vaillant, JM ;
Baxter, DJ ;
Augier, C ;
Herault, D ;
Henderson, RK ;
Hurwitz, JED ;
Grant, LA ;
Volle, JM .
DETECTORS AND ASSOCIATED SIGNAL PROCESSING, 2004, 5251 :187-195
[4]   1/F NOISE AND RADIATION EFFECTS IN MOS DEVICES [J].
FLEETWOOD, DM ;
MEISENHEIMER, TL ;
SCHOFIELD, JH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1994, 41 (11) :1953-1964
[5]   CMOS image sensors: Electronic camera-on-a-chip [J].
Fossum, ER .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1997, 44 (10) :1689-1698
[6]   High-sensitivity and no-crosstalk pixel technology for embedded CMOS image sensor [J].
Furumiya, M ;
Ohkubo, H ;
Muramatsu, Y ;
Kurosawa, S ;
Okamoto, F ;
Fujimoto, Y ;
Nakashiba, Y .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2001, 48 (10) :2221-2227
[7]   Enhanced Radiation-Induced Narrow Channel Effects in Commercial 0.18 μm Bulk Technology [J].
Gaillardin, Marc ;
Goiffon, Vincent ;
Girard, Sylvain ;
Martinez, Martial ;
Magnan, Pierre ;
Paillet, Philippe .
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2011, 58 (06) :2807-2815
[8]   Evidence of a Novel Source of Random Telegraph Signal in CMOS Image Sensors [J].
Goiffon, V. ;
Magnan, P. ;
Martin-Gonthier, P. ;
Virmontois, C. ;
Gaillardin, M. .
IEEE ELECTRON DEVICE LETTERS, 2011, 32 (06) :773-775
[9]   1/F NOISE IS NO SURFACE EFFECT [J].
HOOGE, FN .
PHYSICS LETTERS A, 1969, A 29 (03) :139-&
[10]   A UNIFIED MODEL FOR THE FLICKER NOISE IN METAL OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS [J].
HUNG, KK ;
KO, PK ;
HU, CM ;
CHENG, YC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (03) :654-665