Synthesis and characterization of Nb-doped TiO2(110) surfaces by molecular beam epitaxy

被引：58

作者：

Gao, Y

Liang, Y

Chambers, SA

机构：

[1] Environ. Molec. Sciences Laboratory, Pac. Northwest National Laboratory, MS K2-12, Richland, WA 99352

来源：

SURFACE SCIENCE | 1996年 / 348卷 / 1-2期

关键词：

atomic force microscopy; electron-solid diffraction; molecular beam epitaxy; photoelectron spectroscopy; single crystal epitaxy; titanium oxide;

D O I：

10.1016/0039-6028(95)00943-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Epitaxial films of Nb-doped TiO2 rutile were grown on TiO2(110) rutile at 600 degrees C by molecular beam epitaxy. These films grow in a layer-by-layer fashion for doping levels up to 20 at.%. In addition, reflection high-energy and low-energy electron diffraction, along with X-ray photoelectron diffraction, reveal that the overlayers possess excellent long- and short-range structure order up to 20 at.%. However, strain-induced disorder becomes prevalent for higher doping levels, and the surfaces roughen accordingly. X-ray photoelectron diffraction reveals that Nb atoms substitutionally incorporate at cation sites in the rutile lattice for all doping levels, leading to a mixed rutile NbxTi1-xO2 phase. Analysis of Nb3d and Ti2p core-level binding energies reveal that the oxidation state of both Ti and Nb is 4+.

引用

页码：17 / 27

页数：11

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