Low distortion reflection electron microscopy for surface studies

被引:7
|
作者
Müller, P
Métois, JJ
机构
[1] Univ Aix Marseille 2, CNRS, Ctr Rech Matiere Condensee & Nanosci, UPR, F-13288 Marseille 9, France
[2] Univ Aix Marseille 3, F-13288 Marseille, France
关键词
reflection electron microscopy; silicon surfaces; surface structure; morphology and toughness; dislocations and surface atomic steps; 2D islands; growth or evaporation spiral;
D O I
10.1016/j.susc.2005.09.047
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Owing to its surface sensitivity, reflection electron microscopy (REM) is widely used to study surface structure and surface dynamic processes. However, because of the glancing conditions, REM images are severely foreshortened in one direction by a factor varying between 1/40 and 1/70. If this foreshortening does not really affect the study of roughly one-dimensional objects as monoatomic steps on a surface, it is dramatic when considering the shape of two-dimensional objects (as 2D islands) or even 3D objects (as growth or evaporation spirals) at the surface. In these cases, the distorted images may be numerically corrected, but the finite size of the pixels limits the final resolution. In this paper we show that a simple modification inside the column of the microscope (based on a controlled tilt of the screen, on the use of an intensity magnification and on the large depth of focus available in electron microscopes) allows a true correction of the distortion. We thus are able to obtain low distorted REM images. The results are illustrated by some images of the Si(001) and Si(111) surfaces. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:187 / 195
页数:9
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