Hexamethylenediamine (HMDA) and other long chain aliphatic diamines can induce substrate-independent polymer film deposition from dopamine and several other catechols substrates at relatively low concentrations, however the mechanism of the diamine-promoted effect has remained little understood. Herein, we report data indicating that: (a) film deposition from 1 mM HMDA and dopamine is not affected by chemical oxidation with periodate but is markedly inhibited by resorcinol, which also prevents PDA film formation at 10 mM monomer concentration in the absence of HMDA; (b) N-acetylation of HMDA completely inhibits the effect on PDA film formation; (c) HMDA enables surface functionalization with 1 mM 5,6-dihydroxyindole (DHI) polymerization at pH 9.0 in a resorcinol-inhibitable manner. Structural investigation of the polymers produced from dopamine and DHI in the presence of HMDA using solid state C-13 and N-15 NMR and MALDI-MS suggested formation of covalent cross linked structures. It is concluded that HMDA enhances polydopamine adhesion by acting both on dopamine quinone and downstream, e.g., via covalent coupling with DHI. These results provide new insights into the mechanisms of PDA adhesion and disclose resorcinol as a new potent tool for targeting/mapping quinone intermediates and for controlling polymer growth.
机构:
Wonkwang Univ, Dept Carbon Fus Engn, Iksan 54538, Jeonbuk, South KoreaWonkwang Univ, Dept Carbon Fus Engn, Iksan 54538, Jeonbuk, South Korea
Ryu, Ji Hyun
;
Messersmith, Philip B.
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Univ Calif Berkeley, Dept Bioengn, 210 Hearst Min Bldg, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Mat Sci & Engn, 210 Hearst Min Bldg, Berkeley, CA 94720 USA
Lawrence Berkeley Natl Lab, Mat Sci Div, Berkeley, CA 94720 USAWonkwang Univ, Dept Carbon Fus Engn, Iksan 54538, Jeonbuk, South Korea
Messersmith, Philip B.
;
Lee, Haeshin
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Korea Adv Inst Sci & Technol, Dept Chem, 291 Univ Rd, Daejeon 34141, South Korea
Korea Adv Inst Sci & Technol, Inst NanoCentury, CNiT, 291 Univ Rd, Daejeon 34141, South KoreaWonkwang Univ, Dept Carbon Fus Engn, Iksan 54538, Jeonbuk, South Korea
机构:
Wonkwang Univ, Dept Carbon Fus Engn, Iksan 54538, Jeonbuk, South KoreaWonkwang Univ, Dept Carbon Fus Engn, Iksan 54538, Jeonbuk, South Korea
Ryu, Ji Hyun
;
Messersmith, Philip B.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Calif Berkeley, Dept Bioengn, 210 Hearst Min Bldg, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Mat Sci & Engn, 210 Hearst Min Bldg, Berkeley, CA 94720 USA
Lawrence Berkeley Natl Lab, Mat Sci Div, Berkeley, CA 94720 USAWonkwang Univ, Dept Carbon Fus Engn, Iksan 54538, Jeonbuk, South Korea
Messersmith, Philip B.
;
Lee, Haeshin
论文数: 0引用数: 0
h-index: 0
机构:
Korea Adv Inst Sci & Technol, Dept Chem, 291 Univ Rd, Daejeon 34141, South Korea
Korea Adv Inst Sci & Technol, Inst NanoCentury, CNiT, 291 Univ Rd, Daejeon 34141, South KoreaWonkwang Univ, Dept Carbon Fus Engn, Iksan 54538, Jeonbuk, South Korea