Strong Mid-Infrared Absorption and High Crystallinity of Microstructured Silicon Formed by Femtosecond Laser Irradiation in NF3 Atmosphere

被引:33
作者
Dong, Xiao [1 ]
Li, Ning [2 ,3 ]
Liang, Cong [2 ,3 ]
Sun, Haibin [2 ,3 ]
Feng, Guojin [4 ]
Zhu, Zhen [1 ]
Shao, Hezhu [1 ]
Rong, Ximing [1 ]
Zhao, Li [2 ,3 ]
Zhuang, Jun [1 ]
机构
[1] Fudan Univ, Dept Opt Sci & Engn, Shanghai Ultra Precis Opt Mfg Engn Ctr, Shanghai 200433, Peoples R China
[2] Fudan Univ, State Key Lab Surface Phys, Shanghai 200433, Peoples R China
[3] Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
[4] Natl Inst Metrol, Spectrophotometry Lab, Beijing 100013, Peoples R China
关键词
INFRARED-ABSORPTION; OPTICAL-PROPERTIES;
D O I
10.7567/APEX.6.081301
中图分类号
O59 [应用物理学];
学科分类号
摘要
Arrays of high-quality crystalline conical spikes were formed on silicon surface in the presence of NF3 with femtosecond laser irradiation. The surface of the structures is smooth, and Raman scattering spectroscopy shows that few silicon polymorphs such as a-Si, Si-XII, and Si-III were observed in the conical structures. In the mid-infrared wavelength range of 3-16 mu m, the structured surface exhibits a high absorptance up to 0.8. Additionally, the absorptance of the sample remains almost unchanged after the annealing process. These properties of the structured silicon will make it a promising material for mid-infrared applications in optoelectronic fields. (C) 2013 The Japan Society of Applied Physics
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页数:3
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