Mechanism of femtosecond-laser-induced periodic nanostructure formation on crystalline silicon surface immersed in water

被引：112

作者：

Miyaji, Godai ^{[1
]}

Miyazaki, Kenzo ^{[1
]}

Zhang, Kaifeng ^{[1
]}

Yoshifuji, Takakazu ^{[1
]}

Fujita, Junya ^{[1
]}

机构：

[1] Kyoto Univ, Adv Laser Sci Res Sect, Inst Adv Energy, Uji, Kyoto 6110011, Japan

来源：

OPTICS EXPRESS | 2012年 / 20卷 / 14期

关键词：

THIN-FILMS; REFLECTIVITY; ABLATION; PULSES;

D O I：

10.1364/OE.20.014848

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Focused on silicon surface in water, superimposed multiple shots of linearly polarized 800-nm, 100-fs, 10-Hz laser pulses at lower fluence than the single-pulse ablation threshold are shown to produce two kinds of periodic nanostructures with almost constant periods of 150 nm and 400 nm. Surface plasmon polaritons excited in the surface layer illustrates well the formation of nanostructures and its dynamic properties observed. Pump and probe measurements of the ultrafast change in surface reflectivity during the interaction have demonstrated that the multiple low-fluence fs pulses are crucial to the nanostructuring through the accumulation of non-thermal bonding structure change and the subsequent nanoscale ablation. (c) 2012 Optical Society of America

引用

页码：14848 / 14856

页数：9

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