Feasibility of enhancing the thermoelectric power factor in GaNxAs1-x

被引:14
|
作者
Pichanusakorn, P. [1 ]
Kuang, Y. J. [2 ]
Patel, C. [1 ]
Tu, C. W. [2 ]
Bandaru, P. R. [1 ,2 ]
机构
[1] Univ Calif San Diego, Dept Mech & Aerosp Engn, Mat Sci Program, La Jolla, CA 92093 USA
[2] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
来源
PHYSICAL REVIEW B | 2012年 / 86卷 / 08期
基金
美国国家科学基金会;
关键词
ELECTRON EFFECTIVE-MASS; X-RAY-DIFFRACTION; DENSITY-OF-STATES; SI-DOPED GAAS; THERMAL-CONDUCTIVITY; TRANSPORT PHENOMENA; THIN-FILMS; ALLOYS; SEMICONDUCTORS; LOCALIZATION;
D O I
10.1103/PhysRevB.86.085314
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This study was motivated by the possibility of using N resonant levels interacting with the GaAs conduction band, in GaNxAs1-x (0 < x < 2.5%), to enhance the density of states effective mass (m(d)) and consequently the thermoelectric power factor (S-2 sigma)-where S is the Seebeck coefficient and sigma is the electrical conductivity. However, it was observed that, compared with GaAs, the power factor was reduced in spite of a small increase in the m(d). The influences of carrier passivation and dopant type, as well as the changes in the carrier scattering mechanism, which degrades the carrier mobility, are discussed.
引用
收藏
页数:7
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