Elucidating the Morphological Complexities of Linear Symmetric Triblock Polymers Confined Between Two Parallel Plates: A Self-Consistent Field Theoretic Approach

被引:2
作者
Mohagheghi, Mouge [1 ]
Khomami, Bamin [1 ]
机构
[1] Univ Tennessee, Mat Res & Innovat Lab, Dept Biomol & Chem Engn, Knoxville, TN 37996 USA
基金
美国国家科学基金会;
关键词
nano-patterning; self-consistent field theory (SCFT); thin films; triblock copolymers; COPOLYMER THIN-FILMS; BLOCK-COPOLYMERS; DENSITY MULTIPLICATION; PHASE-BEHAVIOR; NANOSTRUCTURES; ORIENTATION; PATTERNS; SURFACES; SILICA;
D O I
10.1002/mats.201500038
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Three dimensional self-consistent field theoretic simulations have been performed to determine the equilibrium morphologies formed by linear ABC triblock polymer melts confined between two parallel plates that favor the middle block. Our primary goal is to elucidate the conditions under which the perpendicular lamella is stabilized, since this morphology plays a central role in many nanotechnology applications. Key factors, namely, the chain architecture, surface energy and the mismatch between the film thickness d and the bulk lamella period, L-0, determine the final morphologies, e.g., perpendicular and parallel lamella, perforated lamella and wet substrate with parallel cylinders in the core, have been identified. Overall, our findings are fully consistent with the results of limited experimental studies focused on morphology development in thin films of triblock polymer melts. Finally, we have clearly demonstrated that ABC triblocks hold technological advantages over diblocks for nano-lithographic fabrications.
引用
收藏
页码:556 / 565
页数:10
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