Thermal emission of holes from confined levels in strained SiGe channel p-MOSFETS

被引:1
作者
GamezCuatzin, H [1 ]
Marchand, JJ [1 ]
Bremond, G [1 ]
Garchery, L [1 ]
Campidelli, Y [1 ]
Berenguer, M [1 ]
机构
[1] FRANCE TELECOM,CTR NATL ETUD TELECOMMUN,F-38243 MEYLAN,FRANCE
关键词
SiGe; band offset; carrier confinement; p-MOSFET;
D O I
10.1016/S0040-6090(96)09223-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report preliminary results of current transient spectroscopy (CTS) investigations performed on a buried strained Si0.85Ge0.15 channel p-MOSFET structure. Measurements give an activation energy E-a = 83 +/- 10 meV. In these structures the fundamental confined level energy E-0 = 69 meV. We propose that the above activation energy corresponds to thermal emission of holes from E-0 since the summation E-a + E-0 = 152 +/- 20 meV is in good agreement with the measured valence band discontinuity (Delta E-v) values reported in the literature.
引用
收藏
页码:211 / 213
页数:3
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