共 16 条
[1]
Power and linearity characteristics of field-plated recessed-gate AlGaN-GaNHEMTs
[J].
Chini, A
;
Buttari, D
;
Coffie, R
;
Heikman, S
;
Chakraborty, A
;
Keller, S
;
Mishra, UK
.
IEEE ELECTRON DEVICE LETTERS,
2004, 25 (05)
:229-231

Chini, A
论文数: 0 引用数: 0
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机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Buttari, D
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机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Coffie, R
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机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Heikman, S
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机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Chakraborty, A
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机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Keller, S
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机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Mishra, UK
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机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[2]
A C-band high-efficiency second-harmonic-tuned hybrid power amplifier in GaN technology
[J].
Colantonio, Paolo
;
Giannini, Franco
;
Giofre, Rocco
;
Limiti, Ernesto
;
Serino, Antonio
;
Peroni, Marco
;
Romanini, Paolo
;
Proietti, Claudio
.
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES,
2006, 54 (06)
:2713-2722

Colantonio, Paolo
论文数: 0 引用数: 0
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机构:
Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy

Giannini, Franco
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机构:
Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy

Giofre, Rocco
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机构:
Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy

Limiti, Ernesto
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机构:
Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy

Serino, Antonio
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机构:
Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy

Peroni, Marco
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机构:
Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy

Romanini, Paolo
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机构:
Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy

Proietti, Claudio
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机构:
Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy Univ Roma Tor Vergata, Dept Elect Engn, I-00133 Rome, Italy
[3]
IYOMASA K, 2007, 2007 IEEE MTT S INT
[4]
A C-band AlGaN/GaN HEMT with Cat-CVD SiN passivation developed for an over 100 W operation
[J].
Kamo, Y
;
Kunii, T
;
Takeuchi, H
;
Yamamoto, Y
;
Totsuka, M
;
Shiga, T
;
Minami, H
;
Kitano, T
;
Miyakuni, S
;
Oku, T
;
Inoue, A
;
Nanjo, T
;
Chiba, H
;
Suita, M
;
Oishi, T
;
Abe, Y
;
Tsuyama, Y
;
Shirahana, R
;
Ohtsuka, H
;
Iyomasa, K
;
Yamanaka, K
;
Hieda, M
;
Nakayama, M
;
Ishikawa, T
;
Takagi, T
;
Marumoto, K
;
Matsuda, Y
.
2005 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM, VOLS 1-4,
2005,
:495-498

Kamo, Y
论文数: 0 引用数: 0
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Kunii, T
论文数: 0 引用数: 0
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Takeuchi, H
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Yamamoto, Y
论文数: 0 引用数: 0
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Totsuka, M
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Shiga, T
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Minami, H
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Kitano, T
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Miyakuni, S
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Oku, T
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Inoue, A
论文数: 0 引用数: 0
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Nanjo, T
论文数: 0 引用数: 0
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Chiba, H
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Suita, M
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Oishi, T
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Abe, Y
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Tsuyama, Y
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Shirahana, R
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Ohtsuka, H
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Iyomasa, K
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Yamanaka, K
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Hieda, M
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Nakayama, M
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Ishikawa, T
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Takagi, T
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Marumoto, K
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan

Matsuda, Y
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机构:
Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan Mitsubishi Electr Corp, High Frequency & Opt Device Works, Itami, Hyogo 6648641, Japan
[5]
MAEDA M, IEEE T MICROWAVE THE
[6]
A 50OW push-pull AlGaN/GaN HEMT amplifier for l-band high power application
[J].
Maekawa, Arata
;
Yamamoto, Takashi
;
Mitani, Eizo
;
Sano, Seigo
.
2006 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-5,
2006,
:722-725

Maekawa, Arata
论文数: 0 引用数: 0
h-index: 0
机构:
Eudyna Devices Inc, Yamanashi Plant, 1000 Kamisukiawara,Showa Cho, Yamanashi 4093883, Japan Eudyna Devices Inc, Yamanashi Plant, 1000 Kamisukiawara,Showa Cho, Yamanashi 4093883, Japan

Yamamoto, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Eudyna Devices Inc, Yamanashi Plant, 1000 Kamisukiawara,Showa Cho, Yamanashi 4093883, Japan Eudyna Devices Inc, Yamanashi Plant, 1000 Kamisukiawara,Showa Cho, Yamanashi 4093883, Japan

Mitani, Eizo
论文数: 0 引用数: 0
h-index: 0
机构:
Eudyna Devices Inc, Yamanashi Plant, 1000 Kamisukiawara,Showa Cho, Yamanashi 4093883, Japan Eudyna Devices Inc, Yamanashi Plant, 1000 Kamisukiawara,Showa Cho, Yamanashi 4093883, Japan

Sano, Seigo
论文数: 0 引用数: 0
h-index: 0
机构:
Eudyna Devices Inc, Yamanashi Plant, 1000 Kamisukiawara,Showa Cho, Yamanashi 4093883, Japan Eudyna Devices Inc, Yamanashi Plant, 1000 Kamisukiawara,Showa Cho, Yamanashi 4093883, Japan
[7]
Maekawa A, 2005, GAAS 2005: 13TH EUROPEAN GALLIUM ARSENIDE AND OTHER COMPOUND SEMICONDUCTORS APPLICATION SYMPOSIUM, CONFERENCE PROCEEDINGS, P497
[8]
100W C-band single-chip GaNFET power amplifier
[J].
Okamoto, Y
;
Wakejima, A
;
Ando, Y
;
Nakayama, T
;
Matsunaga, K
;
Miyamoto, H
.
ELECTRONICS LETTERS,
2006, 42 (05)
:283-285

Okamoto, Y
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan

Wakejima, A
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan

Ando, Y
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan

Nakayama, T
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan

Matsunaga, K
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan

Miyamoto, H
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan NEC Corp Ltd, R&D Assoc Future Electron Devices, Syst Devices Res Labs, Otsu, Shiga 5200833, Japan
[9]
C-band single-chip GaN-FET power amplifiers with 60-W output power
[J].
Okamoto, Y
;
Wakejima, A
;
Matsunaga, K
;
Ando, Y
;
Nakayama, T
;
Kasahara, K
;
Ota, K
;
Murase, Y
;
Yamanoguchi, K
;
Inoue, T
;
Miyamoto, H
.
2005 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM, VOLS 1-4,
2005,
:491-494

Okamoto, Y
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Wakejima, A
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Matsunaga, K
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Ando, Y
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Nakayama, T
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Kasahara, K
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Ota, K
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Murase, Y
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Yamanoguchi, K
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Inoue, T
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan

Miyamoto, H
论文数: 0 引用数: 0
h-index: 0
机构:
NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan NEC Corp Ltd, Syst Devices Res Labs, Adv HF Device R&D Ctr, R&D Assoc Future Electron Devices, Shiga 5200833, Japan
[10]
Class-F power amplifiers with maximally flat waveforms
[J].
Raab, FH
.
IEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUES,
1997, 45 (11)
:2007-2012

Raab, FH
论文数: 0 引用数: 0
h-index: 0
机构: Green Mountain Radio Research Company, Fort Ethan Alien, Colchester