A Gate Overdrive Protection Technique for Improved Reliability in AlGaN/GaN Enhancement-Mode HEMTs

被引:15
|
作者
Kwan, Alex Man Ho [1 ]
Chen, Kevin J. [1 ]
机构
[1] Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Kowloon, Hong Kong, Peoples R China
关键词
High-voltage gate drive; monolithic integration of enhancement-/depletion-mode (E/D-mode) AlGaN/GaN high-electron mobility transistor (HEMT); reliability; VOLTAGE;
D O I
10.1109/LED.2012.2224632
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
On a GaN smart power integrated-circuit platform, a monolithically integrated gate-protected high-voltage AlGaN/GaN enhancement-/depletion-mode high-electron mobility transistor (HEMT) has been proposed. It can sustain large input gate voltage swing (> 20 V) with enhanced safety (no gate failure observed) and improved reliability (no observable shifting of the threshold voltage), and the breakdown voltage is not sacrificed. Such a protection scheme with a wide input gate bias range also facilitates simple and reliable connections between the gate driver circuits and the power switches without the level shifter circuits for conventional GaN Schottky gate power HEMTs.
引用
收藏
页码:30 / 32
页数:3
相关论文
共 50 条
  • [31] Development and characteristic analysis of enhancement-mode recessed-gate AlGaN/GaN HEMT
    Yue Hao
    Chong Wang
    JinYu Ni
    Qian Feng
    JinCheng Zhang
    Wei Mao
    Science in China Series E: Technological Sciences, 2008, 51 : 784 - 789
  • [32] Gate reliability enhancement of p-GaN gate HEMTs with oxygen compensation technique
    Wang, Chengcai
    Chen, Junting
    Jiang, Zuoheng
    Chen, Haohao
    APPLIED PHYSICS EXPRESS, 2024, 17 (05)
  • [33] Investigation of Enhancement-Mode AlGaN/GaN MIS-HEMT with Recessed Gate Structure
    Xiao, Wenbo
    Sun, Xueqin
    Huang, Le
    Li, Jingbo
    SEMICONDUCTORS, 2024, 58 (08) : 637 - 644
  • [34] Development and characteristic analysis of enhancement-mode recessed-gate AlGaN/GaN HEMT
    Hao Yue
    Wang Chong
    Ni JinYu
    Feng Qian
    Zhang JinCheng
    Mao Wei
    SCIENCE IN CHINA SERIES E-TECHNOLOGICAL SCIENCES, 2008, 51 (06): : 784 - 789
  • [35] High-performance enhancement-mode AlGaN/GaN MOS-HEMTs with fluorinated stack gate dielectrics and thin barrier layer
    高涛
    徐锐敏
    张凯
    孔月婵
    周建军
    孔岑
    郁鑫鑫
    董迅
    陈堂胜
    Journal of Semiconductors, 2016, (06) : 116 - 119
  • [36] High-performance enhancement-mode AlGaN/GaN MOS-HEMTs with fluorinated stack gate dielectrics and thin barrier layer
    Gao Tao
    Xu Ruimin
    Zhang Kai
    Kong Yuechan
    Zhou Jianjun
    Kong Cen
    Yu Xinxin
    Dong Xun
    Chen Tangsheng
    JOURNAL OF SEMICONDUCTORS, 2016, 37 (06)
  • [37] High-performance enhancement-mode AlGaN/GaN MOS-HEMTs with fluorinated stack gate dielectrics and thin barrier layer
    高涛
    徐锐敏
    张凯
    孔月婵
    周建军
    孔岑
    郁鑫鑫
    董迅
    陈堂胜
    Journal of Semiconductors, 2016, 37 (06) : 116 - 119
  • [38] Enhancement-mode AlGaN/GaN with Plasma Oxidation Technology
    Mi, MinHan
    Hou, Bin
    Zhang, Meng
    Ma, XiaoHua
    Hao, Yue
    2017 14TH CHINA INTERNATIONAL FORUM ON SOLID STATE LIGHTING (SSLCHINA) : INTERNATIONAL FORUM ON WIDE BANDGAP SEMICONDUCTORS (IFWS), 2017, : 207 - 209
  • [39] Improvement of the Enhancement-Mode GaN MIS-HEMTs by Fluorine Doping in the Dielectric Gate Stack
    Yang, Tsung-Ying
    Kuo, Mei-Yan
    Wu, Jui-Sheng
    Liang, Yan-Kui
    Rai, Rahul
    Rathaur, Shivendra K.
    Chang, Edward Yi
    IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2025, 24 : 42 - 47
  • [40] Reliability of enhancement-mode p-GaN gate GaN HEMT with multiple field plates
    Wei, Yingqiang
    Wei, Jinghe
    Zhao, Wei
    Wu, Suzhen
    Wei, Yidan
    Liu, Meijie
    Sui, Zhiyuan
    Zhou, Ying
    Li, Yuqi
    Chang, Hong
    Ji, Fei
    Wang, Weibin
    Yang, Lijun
    Liu, Guozhu
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2024, 39 (01)