Electrodeposition of ZnTe films from nonaqueous bath

被引：24

作者：

Chaure, NB ^{[1
]}

Jayakrishnan, R ^{[1
]}

Nair, JP ^{[1
]}

Pandey, RK ^{[1
]}

机构：

[1] BHOPAL UNIV,DEPT PHYS,BHOPAL 462026,INDIA

来源：

SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 1997年 / 12卷 / 09期

关键词：

D O I：

10.1088/0268-1242/12/9/018

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The electrodeposition of ZnTe films on an ITO-coated glass substrate in a bath containing M/10 ZnCl2, M/2000 TeCl4 and M/3.3 KI dissolved in ethylene glycol is described. Cyclic voltammetry in the dark and under illumination was used to identify the potential for ZnTe deposition. It is shown that cubic ZnTe can be grown at -0.95 V. Film characterization by x-ray diffraction and scanning electron microscopy is also discussed.

引用

页码：1171 / 1175

页数：5

共 6 条

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