共 49 条
Molecular Engineering of Porphyrin-Tapes/Phthalocyanine Heterojunctions for a Highly Sensitive Ammonia Sensor
被引:42
作者:

Bengasi, Giuseppe
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Meunier-Prest, Rita
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Univ Bourgogne Franche Comte, Inst Chim Mol Univ Bourgogne ICMUB, CNRS, UMR 6302, 9 Ave Alain Savary, F-21078 Dijon, France Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Baba, Kamal
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机构:
Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg
Univ Bourgogne Franche Comte, Inst Chim Mol Univ Bourgogne ICMUB, CNRS, UMR 6302, 9 Ave Alain Savary, F-21078 Dijon, France Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Kumar, Abhishek
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Univ Bourgogne Franche Comte, Inst Chim Mol Univ Bourgogne ICMUB, CNRS, UMR 6302, 9 Ave Alain Savary, F-21078 Dijon, France Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Pellegrino, Anna Lucia
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg
Univ Catania, Dipartimento Sci Chim, Vle A Doria 6, I-95125 Catania, Italy
INSTM UdR Catania, Vle A Doria 6, I-95125 Catania, Italy Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Boscher, Nicolas D.
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Bouvet, Marcel
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Univ Bourgogne Franche Comte, Inst Chim Mol Univ Bourgogne ICMUB, CNRS, UMR 6302, 9 Ave Alain Savary, F-21078 Dijon, France Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg
机构:
[1] Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg
[2] Univ Bourgogne Franche Comte, Inst Chim Mol Univ Bourgogne ICMUB, CNRS, UMR 6302, 9 Ave Alain Savary, F-21078 Dijon, France
[3] Univ Catania, Dipartimento Sci Chim, Vle A Doria 6, I-95125 Catania, Italy
[4] INSTM UdR Catania, Vle A Doria 6, I-95125 Catania, Italy
关键词:
ammonia;
heterojunctions;
phthalocyanines;
porphyrins;
sensors;
OPTICAL-PROPERTIES;
FUSED PORPHYRINS;
FILMS;
METALLOPORPHYRINS;
CONDUCTANCE;
TAPES;
D O I:
10.1002/aelm.202000812
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
Modulating the interfacial charge alignments by molecular engineering in an organic heterojunction device is a smart strategy to improve its conductivity, which can be exploited in high-performance gas-sensor development. Herein, the fabrication of new organic heterojunction devices based on porphyrin tapes and phthalocyanines and their potentiality in ammonia sensing at different relative humidity (rh) are investigated. The devices are built using dry approach relying on oxidative chemical vapor deposition for simultaneous synthesis, doping, and deposition of the porphyrin tape layer and physical vapor deposition of phthalocyanine layer. The association of the porphyrin tapes with copper phthalocyanine (CuPc) or its perfluorinated analogue (Cu(F16Pc)) in a bilayer device configuration reveals a nonlinear current-voltage characteristic, assigned to the formation of organic heterojunction at the bilayer interface. Cu(F16Pc)-based devices reveal higher response, faster sorption kinetics, stable baseline, and less interference from rh fluctuations toward ammonia than CuPc-based devices, which are attributed to more conducting interface in the former. Moreover, depending on the porphyrin tape associated, Cu(F16Pc)-based devices exhibit sensitivity values 6.7 or 0.4% ppm(-1) and detection limit of 1 ppm or 228 ppb allowing to obtain among the best NH3 sensors reported.
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Johannes Gutenberg Univ Mainz, Inst Inorgan Chem & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany
Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg Johannes Gutenberg Univ Mainz, Inst Inorgan Chem & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany

Baba, Kamal
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg Johannes Gutenberg Univ Mainz, Inst Inorgan Chem & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany

Back, Oliver
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Johannes Gutenberg Univ Mainz, Inst Inorgan Chem & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany Johannes Gutenberg Univ Mainz, Inst Inorgan Chem & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany

Frache, Gilles
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg Johannes Gutenberg Univ Mainz, Inst Inorgan Chem & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany

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Boscher, Nicolas D.
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Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg Johannes Gutenberg Univ Mainz, Inst Inorgan Chem & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany
[10]
Conductive Fused Porphyrin Tapes on Sensitive Substrates by a Chemical Vapor Deposition Approach
[J].
Bengasi, Giuseppe
;
Baba, Kamal
;
Frache, Gilles
;
Desport, Jessica
;
Gratia, Paul
;
Heinze, Katja
;
Boscher, Nicolas D.
.
ANGEWANDTE CHEMIE-INTERNATIONAL EDITION,
2019, 58 (07)
:2103-2108

Bengasi, Giuseppe
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LIST, Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg
Johannes Gutenberg Univ Mainz, Inst Inorgan Chem & Analyt Chem, Duesbergweg 10-14, D-55128 Mainz, Germany LIST, Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Baba, Kamal
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LIST, Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg LIST, Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Frache, Gilles
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LIST, Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg LIST, Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg

Desport, Jessica
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Gratia, Paul
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Boscher, Nicolas D.
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LIST, Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg LIST, Mat Res & Technol, 5 Ave Hauts Fourneaux, L-4362 Esch Sur Alzette, Luxembourg