Oxidation of nonylphenol ethoxylates in aqueous solution by UV-C photolysis, H2O2/UV-C, Fenton and photo-Fenton processes: are these processes toxicologically safe?

被引:15
作者
Karci, Akin [1 ]
Arslan-Alaton, Idil [2 ]
Bekbolet, Miray [1 ]
机构
[1] Bogazici Univ, Inst Environm Sci, TR-34342 Istanbul, Turkey
[2] Istanbul Tech Univ, Dept Environm Engn, Fac Civil Engn, TR-34469 Istanbul, Turkey
关键词
acute toxicity; alkylphenol ethoxylate; Fenton process; H2O2/UV-C process; oxidation product; photo-Fenton process; ALKYLPHENOL ETHOXYLATES; WASTE-WATER; TRANSFORMATION PRODUCTS; DRINKING-WATER; DEGRADATION; REMOVAL; SURFACTANT; BIOASSAYS; FATE;
D O I
10.2166/wst.2013.422
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
UV-C, H2O2/UV-C, Fenton and photo-Fenton treatment of a nonylphenol polyethoxylate (NP-10) were comparatively studied, primarily focusing on the acute toxicity of degradation products. Formic, acetic and oxalic acids were all identified as the degradation products of NP-10; however, the sole common carboxylic acid was found to be formic acid for the studied treatment processes. The percent relative inhibition towards Vibrio fischeri increased from 9% to 33% and 24% after 120 min-UV-C and H2O2/UV-C treatment, respectively. Complete NP-10 and 70% of its total organic carbon (TOC) content was removed by the photo-Fenton process, which ensured the fastest removal rates and lowest inhibitory effect (8% after 120 min treatment). The acute toxicity pattern being observed during H2O2/UV-C and photo-Fenton treatment positively correlated with temporal evolution of the identified carboxylic acids, whereas unidentified oxidation products were the most likely origin of the acute toxicity in UV-C photolysis.
引用
收藏
页码:1801 / 1809
页数:9
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