Effects of RF and DC stress on AlGaN/GaN MODFETs: A low-frequency noise-based investigation

被引:39
作者
Valizadeh, P [1 ]
Pavlidis, D
机构
[1] Univ Michigan, Solid State Elect Lab, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
[2] Tech Univ Darmstadt, Dept High Frequency Elect, Inst Microwave Engn, D-64283 Darmstadt, Germany
关键词
current degradation; DC stress; low-frequency noise; MODFET; RF stress;
D O I
10.1109/TDMR.2005.853515
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The impact of radio frequency (RF) and DC stress on passivated and unpassivated AlGaN/GaN modulation-doped field effect transistors (MODFETs) is investigated by means of DC and low-frequency noise (LFN) measurements. Unpassivated devices endure significant changes in the output resistance, gate, and drain noise current level after RF and DC stress. RF and DC stress of unpassivated devices leads to different degradation time constant and gate noise current. Besides, a positive shift in the pinch-off voltage is found to take place only after RF stress. In contrast to unpassivated devices, passivated devices do not show any considerable variation in the output resistance and gate, and drain noise current characteristics upon RF or DC stress. However, a positive shift in the pinch-off voltage upon RF stress is observed for both types of devices.
引用
收藏
页码:555 / 563
页数:9
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