Terahertz Surface Emission from MoSe2 at the Monolayer Limit

被引:32
作者
Fan, Zeyu [1 ]
Xu, Manzhang [2 ,3 ,4 ,5 ]
Huang, Yuanyuan [1 ]
Lei, Zhen [1 ]
Zheng, Lu [3 ,4 ]
Zhang, Zhiyong [2 ]
Zhao, Wu [2 ]
Zhou, Yixuan [1 ]
Wang, Xuewen [3 ,4 ]
Xu, Xinlong [1 ,5 ]
Liu, Zheng [6 ,7 ]
机构
[1] Northwest Univ, Inst Photon & Photon Technol, Shaanxi Joint Lab Graphene, Sch Phys, Xian 710069, Peoples R China
[2] Northwest Univ, Sch Informat Sci & Technol, Xian 710127, Peoples R China
[3] Northwestern Polytech Univ, Frontiers Sci Ctr Flexible Elect, Inst Flexible Elect IFE, Xian 710072, Peoples R China
[4] Northwestern Polytech Univ, Xian Inst Biomed Mat & Engn, Xian 710072, Peoples R China
[5] Nanyang Technol Univ, Sch Mat Sci & Engn, Singapore 639798, Singapore
[6] Nanyang Technol Univ, Ctr Micro Nanoelect NOVITAS, Sch Elect & Elect Engn, Singapore 639798, Singapore
[7] CINTRA CNRS NTU THALES, UMI 3288, Res Techno Plaza, Singapore 637553, Singapore
基金
新加坡国家研究基金会; 中国国家自然科学基金;
关键词
MoSe2; monolayer; THz emission spectroscopy; surface depletion field; surface optical rectification; CHEMICAL-VAPOR-DEPOSITION; OPTICAL RECTIFICATION; MOBILITY; CRYSTAL; GAAS;
D O I
10.1021/acsami.0c13474
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The surface-charge region of bulk and monolayer MoSe2 is analyzed directly by terahertz (THz) surface emission spectroscopy in a nondestructive way. Both surface nonlinear optical polarization and surface field-induced photocurrent contribute to the THz radiation in both bulk and monolayer MoSe2. The first THz emission mechanism is due to the surface optical rectification and the second one is due to the photo-generated carriers accelerated by the surface depletion field. The THz radiation contribution from the surface optical rectification is basically the same for both bulk and monolayer MoSe2 because of the same symmetry at the surface. However, the contribution from the surface field-induced photocurrent is similar to 94.2% in bulk MoSe2 and it goes down to 74.5% in monolayer MoSe2. This is due to the larger surface depletion field in bulk MoSe2 (similar to 2.54 x 10(7) V/m) compared with that in monolayer MoSe2 (similar to 5.42 x 10(5) V/m), as such THz emission from the bulk is approximately four times larger than that from monolayer MoSe2. This work not only proves the clear THz radiation mechanism from MoSe2 crystals but also affords a THz technology for the surface characterization of two-dimensional materials.
引用
收藏
页码:48161 / 48169
页数:9
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