Electrostatic Field Distribution Measurement Using Silicon Micro-mirror Array

被引：0

作者：

Kuriyama, Toshihide ^{[1
]}

Aoi, Toshikazu ^{[1
]}

Takatsuji, Wataru ^{[2
]}

Maeda, Hiroshi ^{[2
]}

Itoh, Takaki ^{[2
]}

Ueno, Yoshifumi ^{[2
]}

Nakaie, Toshiyuki ^{[3
]}

Matsui, Jun ^{[3
]}

Miyamoto, Yoshiaki ^{[3
]}

机构：

[1] Kinki Univ, Fac Biol Oriented Sci & Technol, 930 Nishimitani, Kinokawa, Wakayama 6496493, Japan

[2] Ind Technol Ctr Wakayama Prefecture, Wakayama 6496261, Japan

[3] Hanwa Elect Ind Co Ltd, Wakayama 6496272, Japan

来源：

2012 IEEE INTERNATIONAL SYMPOSIUM ON ELECTROMAGNETIC COMPATIBILITY (EMC) | 2012年

基金：

日本科学技术振兴机构;

关键词：

MICROMIRROR; TECHNOLOGY; CHARGE;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Electrostatic field distribution measurement using a silicon micro-mirror array fabricated by Micro-Electro-Mechanical Systems (MEMS) process has been presented. The deflection of each micro-mirror by electrostatic field was measured optically using a two-dimensional optical scanner and a position sensitive detector (PSD). The obtained electrostatic data showed good agreement with Coulomb's law and the system was applied to a human body model.

引用

页码：351 / 356

页数：6

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