Piezoelectric force microscopy of crystalline oxide-semiconductor heterostructures

被引:1
|
作者
Marshall, M. S. J. [1 ]
Kumah, D. P. [1 ]
Reiner, J. W. [1 ]
Baddorf, A. P. [2 ]
Ahn, C. H. [1 ]
Walker, F. J. [1 ]
机构
[1] Yale Univ, Dept Appl Phys, CRISP, New Haven, CT 06520 USA
[2] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA
基金
美国国家科学基金会;
关键词
SILICON; FERROELECTRICITY; SRTIO3;
D O I
10.1063/1.4750243
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin films of epitaxial SrTiO3 grown on silicon exhibit compressive in-plane strain that may stabilize ferroelectricity in this normally non-ferroelectric material. We investigate this possibility by using an ultra-high vacuum atomic force microscope to measure the local force response of coherently strained SrTiO3 films on silicon to an applied ac electric field. The observed cantilever response is different in regions that were previously written with positive and negative voltages, but the frequency dependence of this response indicates that the dominant forces are related to electrostatic charging rather than ferroelectricity. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4750243]
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Recent studies of oxide-semiconductor heterostructures using aberration-corrected scanning transmission electron microscopy
    Smith, David J.
    Wu, HsinWei
    Lu, Sirong
    Aoki, Toshihiro
    Ponath, Patrick
    Fredrickson, Kurt
    McDaniel, Martin D.
    Lin, Edward
    Posadas, Agham B.
    Demkov, Alexander A.
    Ekerdt, John
    McCartney, Martha R.
    JOURNAL OF MATERIALS RESEARCH, 2017, 32 (05) : 912 - 920
  • [2] The band gap and band offset in ultrathin oxide-semiconductor heterostructures
    Schmeisser, D.
    Henkel, K.
    Bergholz, M.
    Tallarida, M.
    SUPERLATTICES AND MICROSTRUCTURES, 2010, 47 (03) : 369 - 376
  • [3] Recent studies of oxide-semiconductor heterostructures using aberration-corrected scanning transmission electron microscopy
    David J. Smith
    HsinWei Wu
    Sirong Lu
    Toshihiro Aoki
    Patrick Ponath
    Kurt Fredrickson
    Martin D. McDaniel
    Edward Lin
    Agham B. Posadas
    Alexander A. Demkov
    John Ekerdt
    Martha R. McCartney
    Journal of Materials Research, 2017, 32 : 912 - 920
  • [4] Friction force microscopy characterization of semiconductor heterostructures
    Tamayo, J
    Garcia, R
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1996, 42 (1-3): : 122 - 126
  • [5] CRYSTALLINE SEMICONDUCTOR HETEROSTRUCTURES
    NARAYANAMURTI, V
    PHYSICS TODAY, 1984, 37 (10) : 24 - 32
  • [6] POSITRON STUDIES OF OXIDE-SEMICONDUCTOR STRUCTURES
    UEDONO, A
    WEI, L
    KAWANO, T
    TANIGAWA, S
    SUZUKI, R
    OHGAKI, H
    MIKADO, T
    JOURNAL DE PHYSIQUE IV, 1995, 5 (C1): : 49 - 56
  • [7] Characterization of semiconductor heterostructures and quantum dots by friction force microscopy
    Tamayo, J
    Garcia, R
    APPLIED SURFACE SCIENCE, 1998, 123 : 339 - 342
  • [8] Improvement of technology for the production of a semiconductor cathode of oxide-semiconductor capacitors
    Nevludov, I. Sh
    Gurin, V. N.
    Gurin, D., V
    Oleksandrov, Yu N.
    Yashkov, Ih O.
    FUNCTIONAL MATERIALS, 2019, 26 (02): : 353 - 357
  • [9] Recent advances in the theory of oxide-semiconductor interfaces
    Edwards, AH
    Fowler, WB
    MICROELECTRONICS RELIABILITY, 1999, 39 (01) : 3 - 14
  • [10] RAMAN STUDY OF OXIDE-SEMICONDUCTOR INTERFACIAL REACTIONS
    SCHWARTZ, GP
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1979, 24 (03): : 325 - 325