Free electron behavior in InN: On the role of dislocations and surface electron accumulation

被引：39
作者：
Darakchieva, V. [1 ,2 ]
Hofmann, T. [3 ,4 ]
Schubert, M. [3 ,4 ]
Sernelius, B. E. [2 ]
Monemar, B. [2 ]
Persson, P. O. A. [2 ]
Giuliani, F. [2 ]
Alves, E. [1 ]
Lu, H. [5 ]
Schaff, W. J. [5 ]
机构：
[1] Inst Tecnol & Nucl, P-2686953 Sacavem, Portugal
[2] Linkoping Univ, IFM, SE-58183 Linkoping, Sweden
[3] Univ Nebraska, Dept Elect Engn, Lincoln, NE 68588 USA
[4] Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68588 USA
[5] Cornell Univ, Dept Elect & Comp Engn, Ithaca, NY 14853 USA
来源：
APPLIED PHYSICS LETTERS | 2009年 / 94卷 / 02期
基金：
瑞典研究理事会;
关键词：
dislocations; doping; electron density; Hall effect; III-V semiconductors; indium compounds; semiconductor thin films; transmission electron microscopy; vacancies (crystal); wide band gap semiconductors; ELLIPSOMETRY; LAYER;
D O I：
10.1063/1.3065030
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The free electron behavior in InN is studied on the basis of decoupled bulk and surface accumulation electron densities in InN films measured by contactless optical Hall effect. It is shown that the variation in the bulk electron density with film thickness does not follow the models of free electrons generated by dislocation-associated nitrogen vacancies. This finding, further supported by transmission electron microscopy results, indicates the existence of a different thickness-dependent doping mechanism. Furthermore, we observe a noticeable dependence of the surface electron density on the bulk density, which can be exploited for tuning the surface charge in future InN based devices.
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页数：3
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