Current status of radiation resistance of dielectric mirrors in the DUV

被引：7

作者：

Bernitzki, H ^{[1
]}

Lauth, H ^{[1
]}

Thielsch, R ^{[1
]}

Blaschke, H ^{[1
]}

Kaiser, N ^{[1
]}

Mann, K ^{[1
]}

机构：

[1] Fraunhofer Inst Angew Optik & Feinmech, D-07745 Jena, Germany

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1998 | 1999年 / 3578卷

关键词：

ArF; dielectric mirrors; radiation resistance; mechanical stress;

D O I：

10.1117/12.344386

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Dielectric mirrors (HR0 degrees, HR45 degrees) are key optical components in ArF excimer laser based devices for applications in DUV photolithography as well as in material processing (laser ablation, photochemistry, surgery). In all these applications different requirements of laser radiation resistance have to be met in relation to fluence, repetition rate and pulse number lifetime. Investigations have been performed into the radiation resistance of dielectric mirrors consisting of fluorides and oxides with emphasis to the properties of bending point mirrors (HR45 degrees) used in beam delivery systems of wafer steppers. Problems and limitations for the improvement of the Laser-Induced-Damage-Thresholds of the coatings are discussed.

引用

页码：105 / 116

页数：12

共 18 条

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