Fast System to measure the dynamic on-resistance of on-wafer 600 V normally off GaN HEMTs in hard-switching application conditions

被引:15
作者
Barbato, Alessandro [1 ]
Barbato, Marco [1 ]
Meneghini, Matteo [1 ]
Silvestri, Marco [2 ]
Detzel, Thomas [2 ]
Haeberlen, Oliver [2 ]
Spiazzi, Giorgio [1 ]
Meneghesso, Gaudenzio [1 ]
Zanoni, Enrico [1 ]
机构
[1] Univ Padua, Dept Informat Engn, Via Gradenigo 6-B, I-35131 Padua, Italy
[2] Infineon Technol Austria AG, Siemenstr 2, A-9500 Villach, Austria
关键词
wide band gap semiconductors; III-V semiconductors; gallium compounds; electric resistance measurement; power HEMT; semiconductor device measurement; GaN high electron mobility transistors power devices; boost converter circuit; hard-switching conditions; hot electrons; dynamic RDSON behaviour; GaN-HEMT devices; on-wafer level dynamic properties; GaN-based power transistors; RDSON measurement time; dynamic on-resistance; normally off GaN HEMT; high electron mobility transistors; HEMT power device; field-activated trapping process; voltage; 600; 0; V; GaN; POWER; CIRCUIT; IMPACT;
D O I
10.1049/iet-pel.2019.1455
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This study presents a novel system to investigate the on-wafer level dynamic properties of GaN-based power transistors in hard-switching application conditions. The system is able to analyse devices with an on-resistance (R-DSON) in the range from few ohms to hundreds of ohms, and can be effectively used to improve the development process of GaN high electron mobility transistors (HEMTs) power devices at the wafer level. Contrary to the conventional double-pulse setup, where a resistive load is usually used in combination with a very low duty cycle, the dynamicR(DSON)is acquired during realistic operating conditions, in a boost converter circuit. Consequently, the authors' system is able to study not only the field-activated trapping processes, but also those induced by hard-switching conditions, i.e. promoted by hot electrons and self-heating. The maximum working voltage (600 V) and the minimumR(DSON)measurement time after turn-on (2 mu s) allow evaluating the operation limit of the devices in a voltage/frequency range close to real switching conditions. Working on the wafer level allows a more realistic assessment of the dynamicR(DSON)behaviour before the packaging phase, which is very important to improve the production and development process of GaN-HEMT devices.
引用
收藏
页码:2390 / 2397
页数:8
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