Effects of ZnAl2O4 segregation in high temperature sintered Al-doped ZnO sputtering target on optical and electrical properties of deposited thin films

被引：25

作者：

Wei, Tiefeng ^{[1
]}

Zhang, Yulong ^{[1
]}

Yang, Ye ^{[1
]}

Tan, Ruiqin ^{[2
]}

Cui, Ping ^{[1
]}

Song, Weijie ^{[1
]}

机构：

[1] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China

[2] Ningbo Univ, Sch Informat Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2013年 / 221卷

基金：

浙江省自然科学基金;

关键词：

Al-doped ZnO thin film; Magnetron sputtering; Electrical property; Optical property; ZINC-OXIDE; SOLUBILITY; GROWTH;

D O I：

10.1016/j.surfcoat.2013.01.049

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

In this work, several Al-doped ZnO thin films were sequentially deposited from a high temperature sintered sputtering target in order to understand the effect of ZnAl2O4 segregation in target on optical and electrical properties of the deposited films. It was observed that the Al-doped ZnO films were all well (002) oriented with increasing 20 from 34.25 to 34.38 degrees, which corresponded to the lattice shrinkage from 5.232 angstrom to 5.212 angstrom. The corresponding band gaps for the Al-doped ZnO films increased from 3.47 eV to 3.54 eV as determined from transmittance spectra and the resistivity decreased from 3.7 x 10(-3) Omega cm to 13 x 10(-3) Omega cm. These changes were ascribed to the Al concentration increase from the polished surface to the inner target in the target due to surface segregation of ZnAl2O4 during the high temperature sintering process. (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：201 / 206

页数：6

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