Interface reaction of Ta/Ni81Fe19 or Ni81Fe19/Ta and its suppression

被引:34
作者
Yu, GH [1 ]
Zhao, HC
Li, MH
Zhu, FW
Lai, WY
机构
[1] Univ Sci & Technol Beijing, Dept Mat Phys, Beijing 100083, Peoples R China
[2] Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China
关键词
D O I
10.1063/1.1433913
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ta/Ni81Fe19 and Ni81Fe19/Ta structures are commonly used in the magnetic multilayers with giant magnetoresistance. For a Ta/Ni81Fe19/Ta fundamental structure, Ta seed and Ta cap layers resulted in a loss of moment equivalent to a magnetically dead layer of thickness 1.6+/-0.2 nm. In order to find out the reason, the composition and chemical states at the interface regions of Ta/Ni81Fe19 and Ni81Fe19/Ta were studied using the x-ray photoelectron spectroscopy and peak decomposition technique. The results show that there are thermodynamically favorable reactions at the Ta/Ni81Fe19 and Ni81Fe19/Ta interfaces: 2Ta+Ni=NiTa2. However, the thickness of a magnetically dead layer was significantly reduced by the insertion of a small amount of Bi in the Ta/Ni81Fe19/Ta structure. This result indicates that a surfactant Bi can suppress the interface reaction in multilayers. (C) 2002 American Institute of Physics.
引用
收藏
页码:455 / 457
页数:3
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