Effect of the Structure and Component on Refractive Index of TiO2 Film

被引：0
作者：
Liu Chengshi [1 ,2 ]
Wu Dengxue [1 ,2 ]
Zhao Lili [1 ,2 ]
Liao Zhijun [1 ,2 ]
Lu Tiecheng [1 ,2 ,3 ]
机构：
[1] Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
[2] Sichuan Univ, Key Lab Radiat Phys & Technol, Minist Educ, Chengdu 610064, Peoples R China
[3] Chinese Acad Sci, Int Ctr Mat Phys, Shenyang 110015, Peoples R China
来源：
RARE METAL MATERIALS AND ENGINEERING | 2009年 / 38卷
关键词：
TiO2; film; refractive index; electron beam evaporation;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this work TiO2 films were prepared on silicon substrates by electron beam evaporation, and the refractive index of the films deposited at different temperature, were measured by ellipsometry. The results revealed that the refractive index was improved as increasing the deposition temperature. The structure and composition were characterized by XRD, XPS and FI-IR respectively. The XRD confirmed that the improvement of the refractive index is result from the improvement of the crystallization. And the XPS and Fi-IR confirmed that the refractive index is lower than that of bulk TiO2 due to the presence of non-stoichiometry of TiO(2-x) and SiO(2-x).
引用
收藏
页码：575 / 578
页数：4
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