Design and Electrical Characterization of 2-T Thyristor RAM With Low Power Consumption

被引:12
作者
Kim, Youngmin [1 ,2 ]
Kwon, Min-Woo [3 ]
Ryoo, Kyung-Chang [4 ]
Cho, Seongjae [1 ,2 ]
Park, Byung-Gook [3 ]
机构
[1] Gachon Univ, Grad Sch IT Convergence Engn, Seongnam 13120, South Korea
[2] Gachon Univ, Dept Elect Engn, Seongnam 13120, South Korea
[3] Seoul Natl Univ, Interuniv Semicond Res Ctr, Dept Elect & Informat Engn, Seoul 08826, South Korea
[4] Samsung Elect Co Ltd, Applicat Engn Team, Memory Div, Gyeonggi Do 18848, South Korea
基金
新加坡国家研究基金会;
关键词
Thyristor; 2-T TRAM; TCAD; low power consumption; operation window; capacitorless DRAM; DRAM CELL;
D O I
10.1109/LED.2018.2796139
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, a Si-based two-terminal (2-T) thyristor random-access memory (TRAM) device is designed and characterized, and its operation window and power consumption are closely investigated by technology computer-aided design (TCAD) simulation. The properly scaled 2-T TRAM device has higher reliability since it can rule out impact ionization. Write time (T-write) and erase time (T-erase) reach below 10 ns and zero energy is consumed to hold state achieving high competitiveness with the existing dynamic random-access memory (DRAM). The state current ratio reaches higher than 10(5). Also, V-write and erase voltage (V-erase) of the 2-T TRAM appear to be below 2 and -1.2 V, respectively, in the permissible operation window, with less energy consumption compared with the conventional ones. The 2-T TRAM is a strong candidate for capacitorless DRAM technology.
引用
收藏
页码:355 / 358
页数:4
相关论文
共 14 条
[1]   On the Nature of the Memory Mechanism of Gated-Thyristor Dynamic-RAM Cells [J].
Badwan, Ahmad Z. ;
Li, Qiliang ;
Ioannou, Dimitris E. .
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2015, 3 (06) :468-471
[2]  
Bateman B., 2016, P MEMCON
[3]   Innovating SOI memory devices based on floating-body effects [J].
Bawedin, M. ;
CristoloveanU, S. ;
Flandre, D. .
SOLID-STATE ELECTRONICS, 2007, 51 (10) :1252-1262
[4]  
Gamiz F, 2016, INT CONF ULTI INTEGR, P68, DOI 10.1109/ULIS.2016.7440054
[5]  
Gopalakrishnan K, 2002, INTERNATIONAL ELECTRON DEVICES 2002 MEETING, TECHNICAL DIGEST, P289, DOI 10.1109/IEDM.2002.1175835
[6]   A new capacitorless 1T DRAM cell: Surrounding gate MOSFET with vertical channel (SGVC cell) [J].
Jeong, Hoon ;
Song, Ki-Whan ;
Park, Il Han ;
Kim, Tae-Hun ;
Lee, Yeun Seung ;
Kim, Seong-Goo ;
Seo, Jun ;
Cho, Kyoungyong ;
Lee, Kankyoon ;
Shin, Hyungcheol ;
Lee, Jong Duk ;
Park, Byung-Gook .
IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2007, 6 (03) :352-357
[7]  
Jing Wan, 2012, ESSDERC 2012 - 42nd European Solid State Device Research Conference, P197, DOI 10.1109/ESSDERC.2012.6343367
[8]  
Lee JC, 2016, ISSCC DIG TECH PAP I, V59, P318, DOI 10.1109/ISSCC.2016.7418035
[9]   Investigation of the Turn-ON of T-RAM Cells Under Transient Conditions [J].
Mulaosmanovic, Halid ;
Compagnoni, Christian Monzio ;
Castellani, Niccolo ;
Paolucci, Giovanni M. ;
Carnevale, Gianpietro ;
Fantini, Paolo ;
Ventrice, Domenico ;
Lacaita, Andrea L. ;
Spinelli, Alessandro S. ;
Benvenuti, Augusto .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2015, 62 (04) :1170-1176
[10]   Working Principles of a DRAM Cell Based on Gated-Thyristor Bistability [J].
Mulaosmanovic, Halid ;
Paolucci, Giovanni M. ;
Compagnoni, Christian Monzio ;
Castellani, Niccolo ;
Carnevale, Gianpietro ;
Fantini, Paolo ;
Ventrice, Domenico ;
Lacaita, Andrea L. ;
Spinelli, Alessandro S. ;
Benvenuti, Augusto .
IEEE ELECTRON DEVICE LETTERS, 2014, 35 (09) :921-923